메뉴 건너뛰기




Volumn 26, Issue 11, 2007, Pages 2803-2805

Computational study on the relative reactivities of cobalt and nickel amidinates via β-H migration

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION BARRIER; CHELATING LIGAND; METAL CENTER ATOM; NICKEL AMIDINATES;

EID: 34249941426     PISSN: 02767333     EISSN: None     Source Type: Journal    
DOI: 10.1021/om060910a     Document Type: Article
Times cited : (31)

References (17)
  • 9
    • 34249937663 scopus 로고    scopus 로고
    • Atomic Layer Deposition using Metal Amidinates
    • PCT Int. Patent WO 2004046417
    • Gordon, R. G.; Lim, B. S. Atomic Layer Deposition using Metal Amidinates. PCT Int. Patent WO 2004046417, 2004.
    • (2004)
    • Gordon, R.G.1    Lim, B.S.2
  • 15
    • 0034319689 scopus 로고    scopus 로고
    • Delley, B. J. Chem. Phys. 2000, 113(18), 7756-7764.
    • (2000) J. Chem. Phys , vol.113 , Issue.18 , pp. 7756-7764
    • Delley, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.