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Volumn 11, Issue 3, 2001, Pages

Effect of double-layers formation on the deposition of microcrystalline silicon films in hydrogen diluted silane discharges

(4) Hammad, A a Amanatides, E a Rapakoulias, D E a Mataras, D a

a UNIVERSITY OF PATRAS (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FILM GROWTH; MASS SPECTROMETRY; PHASE COMPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RATE CONSTANTS; SEMICONDUCTING SILICON; SILANES; SURFACE PHENOMENA;

ELECTRON HEATING MECHANISMS; MICROCRYSTALLINE SILICON FILMS;

THIN FILMS;

EID: 0034855037 PISSN: 11554339 EISSN: None Source Type: Conference Proceeding
DOI: 10.1051/jp4:2001398 Document Type: Conference Paper

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.