ZrO 2 thin films on Si substrate

Journal of Materials Science: Materials in Electronics

Volumn 21, Issue 10, 2010, Pages 980-993

  Wong, Yew Hoong ^a   Cheong, Kuan Yew ^a  

^a SCHOOL OF MATERIALS AND MINERAL RESOURCES ENGINEERING   (Malaysia)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TECHNIQUE; DOWN-SCALING; ELECTRICAL PROPERTY; INTEGRATED CIRCUITRY; METAL-OXIDE-SEMICONDUCTOR TECHNOLOGY; MICROELECTRONIC INDUSTRY; SI SUBSTRATES; SI-BASED; THERMAL OXIDATION; ULTRA-THIN;

DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; GATE DIELECTRICS; GATES (TRANSISTOR); MICROELECTRONICS; MOS DEVICES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILMS; ZIRCONIUM; ZIRCONIUM ALLOYS;

SEMICONDUCTING SILICON;

EID: 77957893250     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-010-0144-5     Document Type: Article

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