Characterization of zirconium oxynitride films obtained by radio frequency magnetron reactive sputtering

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 6798-6804

  Signore, M A ^a   Rizzo, A ^a   Mirenghi, L ^a   Tagliente, M A ^a   Cappello, A ^a  

^a ENEA   (Italy)

Author keywords

RF reactive magnetron sputtering; Zirconium oxynitride

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; MAGNETRON SPUTTERING; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

ARGON OXYGEN NITROGEN MIXTURE; OXYGEN FLUXES; REACTIVE MAGNETRON SPUTTERING; SPUTTERING PARAMETERS; ZIRCONIUM OXYNITRIDE;

THIN FILMS;

EID: 34247635543     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.033     Document Type: Article

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