Structure evolution of atomic layer deposition grown ZrO2 films by deep-ultra-violet Raman and far-infrared spectroscopies

Journal of Non-Crystalline Solids

Volumn 322, Issue 1-3, 2003, Pages 105-110

  Bonera, E ^a   Scarel, G ^a   Fanciulli, M ^a  

^a LABORATORIO MDM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; GATES (TRANSISTOR); MICROELECTRONICS; MOLECULAR ORIENTATION; MOS DEVICES; PHONONS; RAMAN SPECTROSCOPY; RAPID THERMAL ANNEALING; SILICA; THIN FILMS;

ATOMIC LAYER DEPOSITION (ALD);

ZIRCONIA;

EID: 0038109976     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(03)00188-1     Document Type: Conference Paper

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