rf-Magnetron sputter deposited ZrO2 dielectrics for metal-insulator-semiconductor capacitors

Vacuum

Volumn 82, Issue 12, 2008, Pages 1367-1370

  Prabakar, K ^a   Park, Anna ^a   Cho, Namhee ^a   Lee, Wan In ^b   Hwangbo, Chang Kwon ^b   Lee, Jae Gab ^c   Lee, Chongmu ^a  

^a Department of Materials Science and Engineering ^*  (South Korea)

^b Inha University   (South Korea)

^c Kookmin University   (South Korea)

Author keywords

C V characteristic curve; Gate dielectrics; I V characteristic curve; rf Magnetron sputtering; ZrO2

Indexed keywords

SPUTTERING;

C-V CHARACTERISTIC CURVE; GATE DIELECTRICS; I-V CHARACTERISTIC CURVE; RF-MAGNETRON SPUTTERING; ZRO2;

ZIRCONIUM ALLOYS;

EID: 49149087873     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.03.039     Document Type: Article

References (23)

1. Wilk G.D., Wallace R.M., and Anthony J.M. J Appl Phys 89 (2001) 5243
2. Stemmer S., Chen Z., and Keding R. J Appl Phys 92 (2002) 82
3. Houssa M., Autran J.L., Stesmans A., and Heyns M.M. Appl Phys Lett 81 (2002) 709
4. Chang J., and Lin Y.-S. Appl Phys Lett 79 (2001) 3666-3668
5. Puthenkovilakam R., Carter E.A., and Chang J.P. Phy Rev B 69 (2004) 155329
6. Chiu F.-C., Wang Z.-h., and Lee J.Y.M. J Appl Phys 97 (2005) 034506
7. Wang M.-T., Deng S.-Y., Tsung-Hong, and Lee J.Y.M. J Electrochem Soc 152 3 (2005) G182
8. Wang M.-T., Deng S.-Y., and Tsung-Hong. J Electrochem Soc 152 7 (2005) G542
9. Dong Y.F., Feng Y.P., Wang S.J., and Huan A.C.H. Phy Rev B 72 (2005) 045327
10. Hu Y.Z., and Tay S.P. J Vac Sci Technol, B 19 (2001) 1706
11. Duparre A., Welsch E., Walter H.G., Kaiser N., Mueller H., Hacker E., et al. Thin Solid Films 187 (1990) 275
12. Kim E.T., and Yoon S.G. Thin Solid Films 227 (1993) 7
13. Xu X.D., Muenchausen R.E., Nogar N.S., Pique A., Edwards R., Wilkens B., et al. Appl Phys Lett 58 (1991) 304
14. Garcia-Hipolito M., Martinez E., Alvarez-Fregoso O., Falcony C., and Aguilar-Frutis M.A. J Mater Sci Lett 20 (2001) 1799
15. Lee B.H., Kang L., Nieh R., Qi W.J., and Lee J. Appl Phys Lett 76 (2000) 1926
16. Lubig A., Buchal Ch., and Gugg D. Thin Solid Films 217 (1992) 125
17. Amora S.B., Rogier B., Baud G., Jacquet M., and Nardin M. Mater Sci Eng B 57 (1998) 28
18. Kim J.S., Marzouk H.A., and Rencroft P.J. Thin Solid Films 254 (1995) 33
19. Guinebreitere R., Soulestia B., and Dauger A. Thin Solid Films 319 (1998) 197
20. JCPDS-ICDD file 17-0923, 27-0997, 42-1164, 50-1089, 20-0684, 49-1642.
21. Garvie R.C., and Gross M.F. J Mater Sci 21 (1986) 1253
22. Sze S.M. Physics of semiconductor devices. 2nd ed. (1981), Wiley, New York
23. Gusev E.P., Cartier E., Gribelyuk D.A., Copel M., Schmidt H.O., and Emic C.D. Microelectron Eng 59 (2001) 341