Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100)

Applied Physics Letters

Volumn 78, Issue 3, 2001, Pages 368-370

  Jeon, T S ^a   White, J M ^a   Kwong, D L ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001459359     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1339994     Document Type: Article

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