Investigation of zirconium oxynitride thin films deposited by reactive pulsed magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 40, Issue 22, 2007, Pages 7057-7062

  Mohamed, S H ^a   Abd El Rahman, A M ^a   Ahmed, Mahrous R ^a  

^a Sohag University   (Egypt)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; PARTIAL PRESSURE; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

NITROGEN PARTIAL PRESSURE; ORTHORHOMBIC; PULSED MAGNETRON SPUTTERING; ZIRCONIUM OXYNITRIDE; ZIRCONIUM OXYNITRIDE FILMS;

THIN FILMS;

EID: 36448972401     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/22/029     Document Type: Article

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