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Volumn 441, Issue 1-2, 2003, Pages 307-310
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Interfacial reactions in Y2O3 thin films deposited on Si(100)
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Author keywords
Metal oxide semiconductors; Oxides; Silicon oxide
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Indexed keywords
ANNEALING;
ELECTRON BEAMS;
HIGH RESOLUTION ELECTRON MICROSCOPY;
ION BEAMS;
SILICON;
SPUTTERING;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
INTERFACIAL REACTIONS;
YTTRIUM COMPOUNDS;
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EID: 0043009842
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(03)00882-4 Document Type: Article |
Times cited : (20)
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References (14)
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