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Volumn 441, Issue 1-2, 2003, Pages 307-310

Interfacial reactions in Y2O3 thin films deposited on Si(100)

Author keywords

Metal oxide semiconductors; Oxides; Silicon oxide

Indexed keywords

ANNEALING; ELECTRON BEAMS; HIGH RESOLUTION ELECTRON MICROSCOPY; ION BEAMS; SILICON; SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0043009842     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00882-4     Document Type: Article
Times cited : (20)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.