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Volumn 51, Issue 2, 1998, Pages 151-152

Interface and oxide properties of rf sputtered Ta2O5- Si structures

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITORS; CHEMICAL BONDS; DEFECTS; ENERGY GAP; HIGH TEMPERATURE EFFECTS; OXIDES; SEMICONDUCTING SILICON; SILICA; SPUTTERING; TANTALUM COMPOUNDS; THIN FILMS;

EID: 0032182722     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00148-1     Document Type: Article
Times cited : (7)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.