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Volumn 51, Issue 2, 1998, Pages 151-152
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Interface and oxide properties of rf sputtered Ta2O5- Si structures
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CAPACITORS;
CHEMICAL BONDS;
DEFECTS;
ENERGY GAP;
HIGH TEMPERATURE EFFECTS;
OXIDES;
SEMICONDUCTING SILICON;
SILICA;
SPUTTERING;
TANTALUM COMPOUNDS;
THIN FILMS;
TANTALUM PENTOXIDE;
INTERFACES (MATERIALS);
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EID: 0032182722
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/s0042-207x(98)00148-1 Document Type: Article |
Times cited : (7)
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References (6)
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