Microstructural improvement of sputtered ZrO2 thin films by substrate biasing

Materials Science and Engineering: B

Volumn 121, Issue 3, 2005, Pages 244-247

  Huang, A P ^a   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Dielectrics; Sputtering; Substrate bias; ZrO2

Indexed keywords

BYPRODUCTS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DIELECTRIC MATERIALS; INTERFACES (MATERIALS); SPUTTERING; SUBSTRATES; ZIRCONIA;

CHANNEL REGIONS; CIRCUIT DENSITY; INTERFACIAL LAYERS; SUBSTRATE BIAS;

THIN FILMS;

EID: 20344382754     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2005.04.002     Document Type: Article

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