Properties of ZrO2 thin films prepared by laser ablation

Materials Science in Semiconductor Processing

Volumn 5, Issue 2-3, 2002, Pages 253-257

  Vrejoiu, I ^a,c   Matei, D G ^a   Morar, M ^a   Epurescu, G ^a   Ferrari, A ^b   Balucani, M ^b   Lamedica, G ^b   Dinescu, G ^a   Grigoriu, C ^a   Dinescu, M ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b SAPIENZA UNIVERSITY OF ROME   (Italy)

^c JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

Ablation film deposition; Dielectric constant; Laser ablation; Microscopy; ZrO2

Indexed keywords

LASER ABLATION; MORPHOLOGY; OXYGEN; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; THIN FILMS;

OXYGEN PRESSURE;

ZIRCONIA;

EID: 0036557704     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(02)00083-5     Document Type: Conference Paper

References (20)

1. Niranjan R.S., Sathaye S.D., Mulla I.S. Sensors Actuators. 64:2001;B81.
2. Kingon A.I., Maria J.P., Streiffer S.K. Nature. 406:2000;1032.
3. Buchanan D.A., Lo S.H. Microelectron Eng. 36:1997;13.
4. Heiser G., Schenk A. J Appl Phys. 81:1997;7900.
5. Alers G.B., Werder D.J., Chabal Y., Lu H.C., Gusev E.P., Garfunkel E., Gustafsson T., Urdahl R.S. Appl Phys Lett. 73:1998;1517.
6. Grahn J.V., Hellberg P.E., Olsson E. J Appl Phys. 84:1998;1632.
7. Wilk G.D., Wallance R.M., Anthony J.M. J Appl Phys. 87:2000;484.
8. Wilk G.D., Wallance R.M., Anthony J.M. J Appl Phys. 89:2001;5243.
9. Sasaki K., Maier J. Solid State Ionics. 134:2000;303.
10. Qi W., Nich R., Lee B., Kang L., Jeon Y., Lee J.C. Appl Phys Lett. 77:2000;3269.
11. Shappir J., Anis A., Pinsky I. IEEE Trans Electron Devices. ED-33:1986;442.
12. Garcia G., Casado J., Llibre J., Figueras A. J Crystal Growth. 156:1995;426.
13. Tomaszewski H., Haemers J., Denul J., DeRoo N., De-Gryse R. Thin Solid Films. 287:1996;104.
14. Copel M., Gribelyuk M.A., Gusev E. Appl Phys Lett. 76:2000;436.
15. Ramanathan S., Wilk G.D., Muller D.A., Park C.M., McIntyre P.C. Appl Phys Lett. 79:2001;2621.
16. Ramanathan S., McIntyre P.C. Appl Phys Lett. 80:2002;3793.
17. Ramanathan S., Muller D.A., Wilk G.D., Park C.M., McIntyre P.C. Appl Phys Lett. 79:2001;3311.
18. Delgado J.C., Sánchez F., Aguiar R., Maniette Y., Ferrater C., Varela M. Appl Phys Lett. 68:1996;1048.
19. Yu J.J., Boyd I.W. Appl Phys A. 75:2002;489.
20. Arnold N., Bäuerle D. Appl Phys A. 68:1999;363.