High-rate reactive sputtering of yttria-stabilized zirconia using pulsed d.c. power

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 333-338

  Yashar, P ^a   Rechner, J ^b,c   Wong, M S ^b,d   Sproul, W D ^b,c   Barnett, S A ^a  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

^c Sputtered Films Inc   (United States)

^d NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

Reactive sputtering; Yttria stabilized zirconia

Indexed keywords

ARGON; CONDUCTIVE MATERIALS; GLASS; HARDNESS; MAGNETRON SPUTTERING; OXYGEN; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY CRYSTALLOGRAPHY; YTTRIUM COMPOUNDS; ZIRCONIUM ALLOYS;

NANOINDENTATION; YTTRIA STABILIZED ZIRCONIA;

ZIRCONIA;

EID: 0031246542     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00270-3     Document Type: Article

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