MOCVD of zirconium oxide thin films: Synthesis and characterization

Applied Surface Science

Volumn 255, Issue 9, 2009, Pages 4792-4795

  Torres Huerta, A M ^a   Dominguez Crespo M A ^a   Ramirez Meneses E ^a   Vargas Garcia J R ^b  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

CVD; Thin films; ZrO 2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FILM GROWTH; GROWTH KINETICS; INTERFACES (MATERIALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDE FILMS; TEMPERATURE; ZIRCONIA;

PREFERENTIAL ORIENTATION; SUBSTRATE TEMPERATURE; SYNTHESIS AND CHARACTERIZATIONS; TEMPERATURE RANGE; THERMODYNAMIC PREDICTIONS; ZIRCONIUM ACETYLACETONATE; ZIRCONIUM DIOXIDE FILMS; ZRO2;

THIN FILMS;

EID: 60249094200     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.11.059     Document Type: Article

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