SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 409, Issue 1, 2002, Pages 138-146

Atomic layer deposition (ALD): From precursors to thin film structures

(2) Leskelä, Markku a Ritala, Mikko a

a UNIVERSITY OF HELSINKI (Finland)

Author keywords

Atomic layer deposition (ALD); Atomic layer epitaxy (ALE); Thin films

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; DIELECTRIC MATERIALS; FILM GROWTH; LOW TEMPERATURE EFFECTS; METALLIZING; MICROELECTRONICS; NITRIDES; PLASMA APPLICATIONS; SURFACE CHEMISTRY;

ATOMIC LAYER DEPOSITION (ALD);

THIN FILMS;

EID: 0037156103 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00117-7 Document Type: Conference Paper

Times cited : (1170)

References (111)

1
- 31944442603
- (1989) Mater. Sci. Rep. , vol.4 , pp. 261
- Suntola, T.¹

2
- 0040218501
- (1999) Chem. Vap. Depos. , vol.5 , pp. 7
- Ritala, M.¹ Leskelä, M.² Dekker, J.-P.³ Mutsaers, C.⁴ Soininen, P.J.⁵ Skarp, J.⁶

3
- 0000128778
- (1996) Appl. Phys. Lett. , vol.66 , pp. 3737
- Kukli, K.¹ Ritala, M.² Leskelä, M.³

4
- 0034646723
- (2000) Science , vol.288 , pp. 319
- Ritala, M.¹ Kukli, K.² Rahtu, A.³

5
- 0006111570
- US Patent no. 4,058,430, 1977
- Suntola, T.¹ Antson, J.²

6
- 0004266127
- T. Suntola, M. Simpson (Eds.), Blackie, Glasgow
- (1990) Atomic Layer Epitaxy , pp. 1
- Leskelä, M.¹ Niinistö, L.²

7
- 0022062138
- (1985) J. Electrochem. Soc. , vol.132 , pp. 1197
- Nishizawa, J.¹ Abe, H.² Kurabayashi, T.³

8
- 0002965918
- (1985) Appl. Phys. Lett. , vol.47 , pp. 51
- Bedair, S.M.¹ Tischler, M.A.² Katsuyama, T.³ El-Masry, N.A.⁴

9
- 0006078994
- T. Suntola, M. Simpson (Eds.), Blackie, Glasgow
- (1990) Atomic Layer Epitaxy , pp. 155
- Yao, T.¹

10
- 0002229227
- (2001) Solid State Technol. , vol.44 , pp. 68
- Demmin, J.C.¹

11
- 33751057501
- (1999) Stud. Surf. Sci. Catal. , vol.120 , pp. 715
- Haukka, S.¹ Lakomaa, E.² Suntola, T.³

12
- 0032682630
- (1999) Nanotechnology , vol.10 , pp. 19
- Ritala, M.¹ Leskelä, M.²

13
- 0001027439
- (1998) Curr. Opin. Solid State Mater. Sci. , vol.3 , pp. 147
- Niinistö, L.¹

14
- 0034452746
- Sinaia, Romania
- (2000) Proceedings of the CAS International Semiconductor Conference , vol.1 , pp. 33
- Niinistö, L.¹

15
- 0342520837
- (1999) J. Phys. IV , vol.9
- Leskelä, M.¹ Ritala, M.²

16
- 0000836443
- H.S. Nalwa (ed.), Academic Press, San Diego, CA
- (2001) Handbook of Thin Film Materials , vol.1 , pp. 103
- Ritala, M.¹ Leskelä, A.²

17
- 33751385818
- (1993) J. Phys. Chem. , vol.97 , pp. 5085
- Haukka, S.¹ Lakomaa, E.-L.² Root, A.³

18
- 0033739843
- (2000) Thin Solid Films , vol.368 , pp. 1
- Matero, R.¹ Rahtu, A.² Ritala, M.³ Leskelä, M.⁴ Sajavaara, T.⁵

19
- 0027668706
- (1993) Supercond. Sci. Technol. , vol.6 , pp. 627
- Leskelä, M.¹ Mölsä, H.² Niinistö, L.³

20
- 0023385756
- (1987) J. Cryst. Growth , vol.84 , pp. 151
- Tammenmaa, M.¹ Asplund, M.² Antson, H.³

21
- 0002885089
- (2001) Chem. Vap. Depos. , vol.7 , pp. 44
- Putkonen, M.¹ Sajavaara, T.² Johansson, L.-S.³ Niinistö, L.⁴

22
- 0035897237
- (2001) Appl. Surf. Sci. , vol.174 , pp. 155
- Nieminen, M.¹ Pukonen, M.² Niinistö, L.³

23
- 0032594211
- (1999) Electrochem. Solid State Lett. , vol.2 , pp. 504
- Vehkamäki, M.¹ Hatanpää, T.² Hänninen, T.³ Ritala, M.⁴ Leskelä, M.⁵

24
- 4243863291
- In press
- Chem. Mater.
- Ihanus, J.¹ Hänninen, T.² Hatanpää, T.³ Aaltonen, T.⁴ Mutikainen, I.⁵ Sajavaara, T.⁶ Keinonen, J.⁷ Ritala, M.⁸ Leskelä, M.⁹

25
- 0006103343
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Ferguson, J.D.¹ George, S.M.²

26
- 0006035899
- American Vacuum Society, Monterey, CA, USA, May, 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Shimogaki, Y.¹ Hamamura, H.² Yamamoto, R.³ Jun, K.Y.⁴ Nishinaka, I.⁵

27
- 0034140916
- (2000) Thin Solid Films , vol.360 , pp. 145
- Klaus, J.W.¹ Ferro, S.J.² George, S.M.³

28
- 0033891630
- (2000) J. Electrochem. Soc. , vol.147 , pp. 1175
- Klaus, J.W.¹ Ferro, S.J.² George, S.M.³

29
- 0006103344
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Sim, H.S.¹ Kim, Y.T.² Jeon, H.³

30
- 0032592370
- (1999) J. Electrochem. Soc. , vol.146 , pp. 3139
- Tägström, P.¹ Mårtensson, P.² Jansson, U.³ Carlsson, J.-O.⁴

31
- 0006078995
- (1998) J. Electrochem. Soc. , vol.145 , pp. 2916
- Ritala, M.¹ Leskelä, M.² Rauhala, E.³ Jokinen, J.⁴

32
- 0001335372
- (2000) Chem. Vap. Depos. , vol.6 , pp. 303
- Kukli, K.¹ Ritala, M.² Schuisky, M.³

33
- 0034300887
- (2000) Langmuir , vol.16 , pp. 8122
- Kukli, K.¹ Aidla, A.² Aarik, J.³

34
- 0000127529
- (2001) J. Electrochem. Soc. , vol.148
- Kukli, K.¹ Forsgren, K.² Ritala, M.³ Leskelä, M.⁴ Aarik, J.⁵ Hårsta, A.⁶

35
- 0035452393
- (2001) J. Cryst. Growth , vol.231 , pp. 262
- Kukli, K.¹ Forsgren, K.² Aarik, J.³

36
- 0035115268
- (2001) Chem. Mater. , vol.13 , pp. 122
- Kukli, K.¹ Aarik, J.² Aidla, A.³

37
- 0034272551
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3319
- Schuisky, M.¹ Hårsta, A.² Aidla, A.³ Kukli, K.⁴ Kiisler, A.-A.⁵ Aarik, J.⁶

38
- 0000303309
- (2000) Chem. Vap. Depos. , vol.6 , pp. 139
- Schuisky, M.¹ Kukli, K.² Ritala, M.³ Hårsta, A.⁴ Leskelä, M.⁵

39
- 0001140789
- (2000) Chem. Vap. Depos. , vol.6 , pp. 297
- Kukli, K.¹ Ritala, M.² Leskelä, M.³

40
- 0006073693
- Strasbourg, June 5-8
- (2001) E-MRS
- Matero, R.¹ Ritala, M.² Leskelä, M.³ Jones, A.C.⁴ Williams, P.A.⁵ Bickley, J.F.⁶ Steiner, A.⁷ Leedham, T.J.⁸ Davis, H.O.⁹

41
- 0034294316
- (2000) Electrochem. Solid State Lett. , vol.3 , pp. 485
- Badot, J.C.¹ Ribes, S.² Yousfi, E.B.³

42
- 0006071754
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Gordon, R.G.¹ Becker, J.² Hausman, D.³

43
- 0032620822
- (1999) Appl. Phys. Lett. , vol.75 , pp. 1521
- Min, J.-S.¹ Park, H.-S.² Kang, S.-W.³

44
- 0034296258
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3868
- Min, J.-S.¹ Park, J.-S.² Park, H.-S.³ Kang, S.-W.⁴

45
- 0035323475
- (2001) Electrochem. Solid State Lett. , vol.4
- Park, J.-S.¹ Lee, M.-J.² Lee, C.-S.³ Kang, S.-W.⁴

46
- 0006109833
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Kim, J.Y.¹ Kim, H.K.² Seo, S.W.³ Kim, Y.⁴ Kim, Y.D.⁵ Jeon, H.⁶

47
- 0001023217
- (1999) Chem. Mater. , vol.7 , pp. 1846
- Hatanpää, T.¹ Ihanus, J.² Kansikas, J.³ Mutikainen, I.⁴ Ritala, M.⁵ Leskelä, M.⁶

48
- 0035967555
- (2001) Thin Solid Films , vol.387 , pp. 29
- Yousfi, E.B.¹ Weinberger, B.² Donsanti, F.³ Cowache, P.⁴ Lincot, D.⁵

49
- 0006036031
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Hwang, K.H.¹ Choi, S.J.² Lee, J.D.³ You, Y.S.⁴ Kim, Y.K.⁵ Kim, H.S.⁶ Song, C.L.⁷ Lee, S.I.⁸

50
- 0006036032
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Schuisky, M.¹ Aarik, J.² Kukli, K.³ Aidla, A.⁴ Lu, J.⁵ Hårsta, A.⁶

51
- 0006073262
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Chang, J.P.¹ Lin, Y.-S.²

52
- 0025683726
- (1990) Acta Polytechn. Scand., Chem. Technol. , vol.195 , pp. 201
- Aarik, J.¹ Aidla, A.² Jaek, A.³ Kiisler, A.-A.⁴ Tammik, A.-A.⁵

53
- 0031546947
- (1996) Appl. Surf. Sci. , vol.112 , pp. 236
- Kukli, K.¹ Aarik, J.² Aidla, A.³ Siimon, H.⁴ Ritala, M.⁵ Leskelä, M.⁶

54
- 0343390442
- (1999) J. Phys. IV France , vol.9
- Ritala, M.¹ Juppo, M.² Kukli, K.³ Rahtu, A.⁴ Leskelä, M.⁵

55
- 0033732664
- (2000) Langmuir , vol.16 , pp. 4034
- Juppo, M.¹ Rahtu, A.² Ritala, M.³ Leskelä, M.⁴

56
- 0000467434
- (2000) Electrochem. Soc. Proc. , vol.2000 , Issue.13 , pp. 105
- Rahtu, A.¹ Ritala, M.²

57
- 0032651715
- (1999) Appl. Surf. Sci. , vol.142 , pp. 204
- Rosenthal, A.¹ Tarre, A.² Adamson, P.³ Gerst, A.⁴ Kasikov, A.⁵ Niilisk, A.⁶

58
- 0034513072
- (2000) J. Cryst. Growth , vol.220 , pp. 531
- Aarik, J.¹ Aidla, A.² Mändar, H.³ Sammelselg, V.⁴

59
- 0035282191
- (2001) Appl. Surf. Sci. , vol.172 , pp. 148
- Aarik, J.¹ Aidla, A.² Mändar, H.³ Uustare, T.⁴

60
- 0033690095
- (2000) Thin Solid Films , vol.370 , pp. 163
- Aarik, J.¹ Aidla, A.² Sammelselg, V.³ Uustare, T.⁴ Ritala, M.⁵ Leskelä, M.⁶

61
- 0034229297
- (2000) Appl. Surf. Sci. , vol.161 , pp. 385
- Aarik, J.¹ Aidla, A.² Uustare, T.³ Ritala, M.⁴ Leskelä, M.⁵

62
- 0035900121
- (2001) Langmuir , vol.17 , pp. 6506
- Rahtu, A.¹ Alaranta, T.² Ritala, M.³

63
- 0033886407
- (2000) Appl. Surf. Sci. , vol.153 , pp. 223
- Yousfi, E.B.¹ Fouache, J.² Lincot, D.³

64
- 0035673331
- (2001) Chem. Mater. , vol.13 , pp. 4506
- Matero, R.¹ Rahtu, A.² Ritala, M.³

65
- 0002179435
- (2002) Chem. Vap. Depos. , vol.8 , pp. 21
- Rahtu, A.¹ Ritala, M.²

66
- 0034839628
- (2001) Chem. Mater. , vol.13 , pp. 817
- Rahtu, A.¹ Kukli, K.² Ritala, M.³

67
- 0006066446
- Submitted
- Phys. IV France
- Rahtu, A.¹ Hänninen, T.² Ritala, M.J.³

68
- 0036121227
- (2002) Chem. Mater. , vol.14 , pp. 281
- Juppo, M.¹ Rahtu, A.² Ritala, M.³

69
- 0034188662
- (2000) J. Cryst. Growth , vol.212 , pp. 459
- Kukli, K.¹ Ritala, M.² Matero, R.³ Leskelä, M.⁴

70
- 0034825377
- (2001) Appl. Surf. Sci. , vol.173 , pp. 15
- Aarik, J.¹ Aidla, A.² Mändar, H.³ Uustare, T.⁴ Kukli, K.⁵ Schuisky, M.⁶

71
- 0001174123
- (1999) J. Appl. Phys. , vol.86 , pp. 5656
- Kukli, K.¹ Ritala, M.² Leskelä, M.³

72
- 0002058460
- (2001) J. Electrochem. Soc. , vol.148
- Kukli, K.¹ Ritala, M.² Leskelä, M.³

73
- 0000162605
- (2000) Appl. Phys. Lett. , vol.76 , pp. 176
- Gusev, E.P.¹ Copel, M.² Cartier, E.³ Baumvol, I.J.R.⁴ Krug, C.⁵ Gribelyuk, M.A.⁶

74
- 0035971779
- (2001) Appl. Phys. Lett. , vol.78 , pp. 2670
- Copel, M.¹ Cartier, E.² Gusev, E.P.³ Guha, S.⁴ Bojarczuk, N.⁵ Poppeler, M.⁶

75
- 0035872897
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

76
- 0034531548
- (2000) Surf. Coat. Technol. , vol.131 , pp. 79
- Yang, W.S.¹ Kim, Y.K.² Yang, S.-Y.³

77
- 0001716170
- (2000) Appl. Phys. Lett. , vol.77 , pp. 1381
- Houssa, M.¹ Stesmans, A.² Naili, M.³ Heyns, M.M.⁴

78
- 0006071445
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Gusev, E.P.¹ Cartier, E.² Buchanan, D.A.³

79
- 0000020022
- (2000) Appl. Phys. Lett. , vol.76 , pp. 436
- Copel, M.¹ Gribelyuk, M.A.² Gusev, E.³

80
- 0035896875
- (2001) Appl. Phys. Lett. , vol.78 , pp. 2357
- Perkins, C.M.¹ Triplett, B.B.² McIntyre, P.C.³ Saraswat, K.C.⁴ Haukka, S.⁵ Tuominen, M.⁶

81
- 0000666935
- (2000) J. Appl. Phys. , vol.87 , pp. 1921
- Zhang, H.¹ Solanki, R.² Roberds, B.³ Bai, G.⁴ Banerjee, I.⁵

82
- 0006036033
- In press
- J. Non-Cryst. Solids
- Kukli, K.¹ Ritala, M.² Leskelä, M.³ Sajavaara, T.⁴ Keinonen, J.⁵ Gilmer, D.⁶ Bagchi, S.⁷ Prabhu, L.⁸

83
- 0006109835
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Besling, W.F.A.¹ Haukka, S.² Tuominen, M.³

84
- 0033808389
- (2000) Chem. Mater. , vol.12 , pp. 1914
- Kukli, K.¹ Ritala, M.² Leskelä, M.³

85
- 0034853664
- (2001) Chem. Mater. , vol.13 , pp. 1528
- Rahtu, A.¹ Ritala, M.² Leskelä, M.³

86
- 0002678712
- (2001) Chem. Vap. Depos. , vol.7 , pp. 75
- Vehkamäki, M.¹ Hänninen, T.² Ritala, M.³

87
- 0006036198
- (2000) Electrochem. Soc. Proc. , vol.2000 , Issue.13 , pp. 597
- Ritala, M.¹ Kukli, K.² Vehkamäki, M.³

88
- 0006111576
- To be submitted
- Putkonen, M.¹ Kosola, A.² Niinistö, L.³

89
- 0009765620
- (1999) Chem. Mater. , vol.11 , pp. 1712
- Ritala, M.¹ Kalsi, P.² Riihelä, D.³ Kukli, K.⁴ Leskelä, M.⁵ Jokinen, J.⁶

90
- 0029310169
- (1995) J. Electrochem. Soc. , vol.142 , pp. 1670
- Ritala, M.¹ Leskelä, M.² Rauhala, E.³ Haussalo, P.⁴

91
- 18044401491
- (2001) Chem. Vap. Depos. , vol.7 , pp. 211
- Juppo, M.¹ Alen, P.² Ritala, M.³ Leskelä, M.⁴

92
- 0034275371
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3377
- Juppo, M.¹ Ritala, M.² Leskelä, M.³

93
- 0006124002
- in press
- MRS Proc.
- Elers, K.-E.¹ Saanila, V.² Soininen, P.J.³ Haukka, S.⁴

94
- 24644480736
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2122
- Mårtensson, P.¹ Juppo, M.² Ritala, M.³ Leskelä, M.⁴ Carlsson, J.-O.⁵

95
- 0034431454
- (2000) Mater. Res. Soc. Symp. Proc. , vol.612
- Satta, A.¹ Beyer, G.² Maex, K.³ Elers, K.-E.⁴ Haukka, S.⁵ Vantomme, A.⁶

96
- 0006109837
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Smith, S.R.¹ Elers, K.-E.²

97
- 0033279495
- (1999) Mater. Res. Soc. Symp. Proc. , vol.564 , pp. 207
- Min, J.-S.¹ Park, H.S.² Koh, W.³ Kang, S.-W.⁴

98
- 0034274290
- (2000) Thin Solid Films , vol.372 , pp. 276
- Kim, D.-J.¹ Young, Y.-B.² Lee, M.-B.³ Lee, Y.-H.⁴ Lee, J.-H.⁵ Lee, J.-H.⁶

99
- 0006068761
- Acta Univ. Uppsala, Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, 421 (1999) and the publications therein
- Mårtensson, P.¹

100
- 0031523650
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 2330
- Juppo, M.¹ Ritala, M.² Leskelä, M.³

101
- 0032397435
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 2845
- Juppo, M.¹ Vehkamäki, M.² Ritala, M.³ Leskelä, M.⁴

102
- 0034294315
- (2000) Electrochem. Solid State Lett. , vol.3 , pp. 479
- Solanki, R.¹ Pathangey, B.²

103
- 0342323747
- (2000) Appl. Surf. Sci. , vol.157 , pp. 151
- Utriainen, M.¹ Kröger-Laukkanen, M.² Johansson, L.-S.³ Niinistö, L.⁴

104
- 23044522146
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 2016
- Rossnagel, S.M.¹ Sherman, A.² Turner, F.³

105
- 0006111578
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Kim, H.¹ Rossnagel, S.M.²

106
- 0034291928
- (2000) Jpn. J. Appl. Phys. , vol.39 , pp. 5732
- Satoh, Y.¹ Ikeda, K.² Sugahara, S.³ Matsumura, M.⁴

107
- 0032366188
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 679
- Hasunumu, E.¹ Sugahara, S.² Hoshina, S.³ Imai, S.⁴ Ikeda, K.⁵ Matsumura, M.⁶

108
- 0006035190
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Kang, S.-W.¹

109
- 0035062293
- (2001) Jpn. J. Appl. Phys. , vol.285 , pp. 285
- Jeong, C.-W.¹ Lee, J.-S.² Joo, S.-K.³

110
- 0006036408
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Choi, S.W.¹ Lee, C.-S.² Koh, W.³

111
- 0006111579
- American Vacuum Society, Monterey, CA, USA, May 14-15
- (2001) Atomic Layer Deposition, Topical Conference
- Doh, T.¹ Koo, J.² Kim, Y.³ Han, J.⁴ Kim, Y.⁵ Jeon, H.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.