High-κ/metal gate science and technology

Annual Review of Materials Research

Volumn 39, Issue , 2009, Pages 181-202

  Guha, Supratik ^a   Narayanan, Vijay ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Capping layers; Hafnium oxide; Metal gates; Mobility; Oxygen vacancies

Indexed keywords

CAPPING LAYERS; HAFNIUM OXIDE; KEY MATERIALS; LOW POWER APPLICATION; MATERIALS INNOVATIONS; METAL ELECTRODES; METAL GATE; METAL GATES; MOBILITY; OXYNITRIDE; SCIENCE AND TECHNOLOGY; THERMAL INSTABILITIES; THERMALLY STABLE;

ELECTRON MOBILITY; GATE DIELECTRICS; HAFNIUM; HAFNIUM COMPOUNDS; INNOVATION; METALS; NITRIDES; OXIDES; OXYGEN; THERMODYNAMIC STABILITY;

OXYGEN VACANCIES;

EID: 67650983084     PISSN: 15317331     EISSN: None     Source Type: Book Series    
DOI: 10.1146/annurev-matsci-082908-145320     Document Type: Review

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