Towards understanding the superior properties of transition metal oxynitrides prepared by reactive DC magnetron sputtering

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 228-234

  Venkataraj, S ^a   Severin, D ^a   Mohamed, S H ^a   Ngaruiya, J ^a   Kappertz, O ^a   Wuttig, M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Oxynitrides; Sputtering; Stress; X ray diffraction; X ray reflectivity

Indexed keywords

ELLIPSOMETRY; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRESS ANALYSIS; TRANSITION METALS; X RAY DIFFRACTION;

FILM STOICHIOMETRY; OXYNITRIDES; TARGET VOLTAGE; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 33344473338     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.280     Document Type: Conference Paper

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