Resistless nanofabrication by stencil lithography: A review

Microelectronic Engineering

Volumn 132, Issue , 2015, Pages 236-254

  Vazquez Mena, O ^a,c   Gross, L ^b   Xie, S ^a   Villanueva, L G ^a   Brugger, J ^a  

^a EPFL   (Switzerland)

^b IBM RESEARCH ZURICH   (Switzerland)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Flexible devices; Nanofabrication; Nanopatterning; Resistless patterning; Shadow masks; Stencil lithography

Indexed keywords

CONTACTS (FLUID MECHANICS); DEPOSITION; ETCHING; FABRICATION; ION IMPLANTATION; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOSYSTEMS; NANOTECHNOLOGY; PLASMONICS; PLASMONS;

FLEXIBLE DEVICE; NANOPATTERNING; RESISTLESS PATTERNING; SHADOW MASK; STENCIL LITHOGRAPHY;

SUBSTRATES;

EID: 85027940534     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2014.08.003     Document Type: Review

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