Predicting mask distortion, clogging and pattern transfer for stencil lithography

Microelectronic Engineering

Volumn 84, Issue 1, 2007, Pages 42-53

  Lishchynska, Maryna ^a   Bourenkov, Victor ^a   van den Boogaart, Marc A F ^b   Doeswijk, Lianne ^b   Brugger, Juergen ^b   Greer, James C ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b EPFL   (Switzerland)

Author keywords

MEMS; Modelling; Pattern transfer; Stencil lithography; Stencil stabilization; Stress induced deformation

Indexed keywords

COMPUTER SIMULATION; DEFORMATION; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; NANOTECHNOLOGY;

MASK DISTORTION; PATTERN TRANSFER; STENCIL LITHOGRAPHY; STENCIL STABILIZATION; STENCILS; STRESS INDUCED DEFORMATION;

MASKS;

EID: 33751427873     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.08.003     Document Type: Article

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