Synthesis of localized 2D-layers of silicon nanoparticles embedded in a SiO 2 layer by a stencil-masked ultra-low energy ionmplantation process

Physica Status Solidi (A) Applications and Materials Science

Volumn 204, Issue 2, 2007, Pages 487-491

  Dumas, C ^a   Grisolia, J ^a   Ressier, L ^a   Arbouet, A ^b   Paillard, V ^b   Ben Assayag, G ^c   Claverie, A ^c   Van Den Boogaart, M A F ^d   Brugger, J ^d  

^a INSA   (France)

^b UNIVERSITÉ PAUL SABATIER   (France)

^c CEMES CNRS   (France)

^d EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

LOCALIZED SWELLING; PERIODIC ARRAY; STENCIL-MASKED; ULTRA-LOW ENERGY IONMPLANTATION;

ANNEALING; ATOMIC FORCE MICROSCOPY; ION IMPLANTATION; NANOPARTICLES; PHOTOLUMINESCENCE SPECTROSCOPY; QUANTUM CONFINEMENT; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS;

SILICA;

EID: 34547175347     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200673232     Document Type: Conference Paper

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