Self-assembled monolayer coatings on nanostencils for the reduction of materials adhesion

Advanced Functional Materials

Volumn 13, Issue 3, 2003, Pages 219-224

  Kölbel, Marius ^a   Tjerkstra, R Willem ^a   Kim, Gyuman ^a   Brugger, Jürgen ^a,c   Van Rijn, Cees J M ^b   Nijdam, Wietze ^b   Huskens, Jurriaan ^a   Reinhoudt, David N ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b AQUAMARIJN MICRO FILTRATION B V   (Netherlands)

^c EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; COATINGS; CONTACT ANGLE; EVAPORATION; REDUCTION; SELF ASSEMBLY; SILICON NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOSTENCILS;

NANOSTRUCTURED MATERIALS;

EID: 0037354014     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/adfm.200390033     Document Type: Article

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