Etching of sub-micrometer structures through Stencil

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 1010-1014

  Villanueva, G ^a   Vazquez Mena, O ^a   van den Boogaart, M A F ^a   Sidler, K ^a   Pataky, K ^a   Savu, V ^a   Brugger, J ^a  

^a EPFL   (Switzerland)

Author keywords

Reactive ion etching (RIE); Shadow mask; Stencil

Indexed keywords

DEPOSITION; LITHOGRAPHY; REACTIVE ION ETCHING;

SHADOW MASK; STENCIL LITHOGRAPHY (SL);

MICROMETERS;

EID: 44149112584     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.068     Document Type: Article

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