Fabrication of a high-aspect-ratio stainless steel shadow mask and its application to pentacene thin-film transistors

Journal of Micromechanics and Microengineering

Volumn 15, Issue 2, 2005, Pages 263-269

  Yi, Sang Min ^a   Jin, Sung Hun ^b   Lee, Jong Duk ^b   Chu, Chong Nam ^a  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DRILLING; FABRICATION; LASER BEAMS; MICROMACHINING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; STAINLESS STEEL; THIN FILMS; TRANSISTORS;

ELECTROCHEMICAL ETCHING; ORGANIC THIN-FILM TRANSISTORS (OTFT); PHOTOCHEMICAL MACHINING; WIRE ELECTRICAL DISCHARGE MACHINING (WEDM);

ELECTRIC DISCHARGE MACHINING;

EID: 14244254198     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/2/003     Document Type: Article

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