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Volumn 75, Issue 9, 1999, Pages 1314-1316

Parallel nanodevice fabrication using a combination of shadow mask and scanning probe methods

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; MASKS; OPTICAL MICROSCOPY; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0038768201     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124679     Document Type: Article
Times cited : (105)

References (15)
  • 2
    • 0012064449 scopus 로고
    • London
    • D. M. Eigler and E. K. Schweizer, Nature (London) 344, 524 (1990); M. F. Crommie, C. P. Lutz, and D. M. Eigler, Science 262, 218 (1993).
    • (1990) Nature , vol.344 , pp. 524
    • Schweizer, E.K.1
  • 3
    • 0039809542 scopus 로고
    • D. M. Eigler and E. K. Schweizer, Nature (London) 344, 524 (1990); M. F. Crommie, C. P. Lutz, and D. M. Eigler, Science 262, 218 (1993).
    • (1993) Science , vol.262 , pp. 218
    • Crommie, M.F.1    Lutz, C.P.2    Eigler, D.M.3
  • 4
    • 0031246660 scopus 로고    scopus 로고
    • For a recent review see, for example, C. F. Quate, Surf. Sci. 386, 259 (1997).
    • (1997) Surf. Sci. , vol.386 , pp. 259
    • Quate, C.F.1
  • 8
    • 85034190637 scopus 로고    scopus 로고
    • Omicron Vakuumphysik GmbH, 65232 Taunusstein, Germany
    • Omicron Vakuumphysik GmbH, 65232 Taunusstein, Germany.
  • 9
    • 85034195523 scopus 로고    scopus 로고
    • Park Scientific Instruments, Sunnyvale, CA 94089
    • Park Scientific Instruments, Sunnyvale, CA 94089.
  • 10
    • 85034196817 scopus 로고    scopus 로고
    • The rms roughness of the surface was measured to be below 1 nm over an area of 2 μm×2 μm
    • The rms roughness of the surface was measured to be below 1 nm over an area of 2 μm×2 μm.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.