Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 1237-1240

  Vazquez Mena O ^a   Villanueva, G ^a   van den Boogaart, M A F ^a   Savu, V ^a   Brugger, J ^a  

^a EPFL   (Switzerland)

Author keywords

Cleaning; Clogging; Nanostencils; Shadow mask; Stencil lithography

Indexed keywords

ALUMINUM; DEPOSITION; ETCHING; LITHOGRAPHY; REUSABILITY;

NANOSTENCILS; SHADOW MASK; STENCIL LITHOGRAPHY;

NANOSTRUCTURES;

EID: 44149097640     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.083     Document Type: Article

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