Reliable and improved nanoscale stencil lithography by membrane stabilization, blurring, and clogging corrections

IEEE Transactions on Nanotechnology

Volumn 10, Issue 2, 2011, Pages 352-357

  Vazquez Mena, Oscar ^a   Sidler, Katrin ^a   Savu, Veronica ^a   Park, Chan Woo ^b   Guillermo Villanueva, Luis ^a   Brugger, Juergen ^a  

^a EPFL   (Switzerland)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Blurring; clogging; nanowires; reinforced membranes; stencil lithography (SL)

Indexed keywords

BLURRING; CLOGGING; CORRESPONDING SOLUTIONS; HEXAGONAL ARRAYS; MEMBRANE STABILIZATION; METAL WET ETCHING; NANO SCALE; NANO-APERTURES; POLY-SI; REINFORCED MEMBRANES; STENCIL LITHOGRAPHY; STENCIL LITHOGRAPHY (SL);

LITHOGRAPHY; NANOWIRES; WET ETCHING;

MEMBRANES;

EID: 79951865198     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2010.2042724     Document Type: Article

References (20)

1. R. Luthi, R. R. Schlittler, J. Brugger, P. Vettiger, M. E. Welland, and J. K. Gimzewski, "Parallel nanodevice fabrication using a combination of shadow mask and scanning probe methods," Appl. Phys. Lett., vol. 75, pp. 1314-1316, 1999. (Pubitemid 129308545)
2. M. M. Deshmukh, D. C. Ralph, M. Thomas, and J. Silcox, "Nanofabrication using a stencil mask," Appl. Phys. Lett., vol. 75, pp. 1631-1633, 1999. (Pubitemid 129304377)
3. J. Brugger, J. W. Berenschot, S. Kuiper, W. Nijdam, B. Otter, and M. Elwenspoek, "Resistless patterning of sub-micron structures by evaporation through nanostencils," Microelectron. Eng., vol. 53, pp. 403-405, 2000.
4. A. Linklater and J. Nogami, "Defining nanoscale metal features on an atomically clean silicon surface with a stencil," Nanotechnology, vol. 19, pp. 285302-1-285302-8, 2008.
5. X. M. Yan, A. M. Contreras, M. M. Koebel, J. A. Liddle, and G. A. Somorjai, "Parallel fabrication of sub-50-nm uniformly sized nanoparticles by deposition through a patterned silicon nitride nanostencil," Nano Lett., vol. 5, pp. 1129-1134, 2005. (Pubitemid 40925428)
6. T. N. Tun,M. Lwin, A. H. H. Kim, A. N. Chandrasekhar, and C. Joachim, "Wetting studies on Au nanowires deposited through nanostencil masks," Nanotechnology, vol. 18, pp. 335301-1-335301-8, 2007.
7. V. Savu, S. Neuser, G. Villanueva, O. Vazquez-Mena, K. Sidler, and J. Brugger, "Stenciled conducting bismuth nanowires," J. Vacuum Sci. Technol., vol. 28, pp. 169-172, 2010.
8. O. Vazquez-Mena, G. Villanueva, V. Savu, K. Sidler, M. A. F. van den Boogaart, and J. Brugger, "Metallic nanowires by full wafer stencil lithography," Nano Lett., vol. 8, pp. 3675-3682, 2008.
9. E. A. Speets, P. T. Riele, M. A. F. van den Boogaart, L. M. Doeswijk, B. J. Ravoo, G. Rijnders, J. Brugger, D. N. Reinhoudt, and D. H. A. Blank, "Formation of metal nano-and micropatterns on self-assembled monolayers by pulsed laser deposition through nanostencils and electroless deposition," Adv. Funct. Mater., vol. 16, pp. 1337-1342, 2006. (Pubitemid 44049456)
10. Y. X. Zhou, A. T. Johnson, J. Hone, and W. F. Smith, "Simple fabrication of molecular circuits by shadow mask evaporation," Nano Lett., vol. 3, pp. 1371-1374, 2003. (Pubitemid 37346976)
11. K. Sidler, O. Vazquez-Mena, V. Savu, G. Villanueva, M. A. F. van den Boogaart, and J. Brugger, "Resistivity measurements of gold wires fabricated by stencil lithography on flexible polymer substrates," Microelectron. Eng., vol. 85, pp. 1108-1111, 2008.
12. J. Arcamone, M. A. F. v. d. Boogaart, F. Serra-Graells, J. Fraxedas, J. Brugger, and F. Rez-Murano, "Full-wafer fabrication by nanostencil lithography of micro/nanomechanical mass sensors monolithically integrated with CMOS," Nanotechnology, vol. 19, pp. 305302-1-305302-13, 2008.
13. A. R. Champagne, A. J. Couture, F. Kuemmeth, and D. C. Ralph, "Nanometer-scale scanning sensors fabricated using stencil lithography," Appl. Phys. Lett., vol. 82, pp. 1111-1113, 2003.
14. M. Lishchynska, V. Bourenkov, M. A. F. van den Boogaart, L. Doeswijk, J. Brugger, and J. C. Greer, "Predicting mask distortion, clogging and pattern transfer for stencil lithography," Microelectron. Eng., vol. 84, pp. 42-53, 2007. (Pubitemid 44820399)
15. J. Arcamone, A. Sanchez-Amores, J. Montserrat, M. A. F. van den Boogaart, J. Brugger, and F. Perez-Murano, "Dry etching for the correction of gap-induced blurring and improved pattern resolution in nanostencil lithography," J. Micro-Nanolithography MEMS MOEMS, vol. 6, pp. 013005-1-013005-7, 2007.
16. R. Hammer, "Solving the ''stencil'' problem in vacuum deposition masks using rib-supported structures," J. Vacuum Sci. Technol., vol. 14, pp. 1208-1210, 1977. (Pubitemid 8554124)
17. M. A. F. van den Boogaart, M. Lishchynska, L. M. Doeswijk, J. C. Greer, and J. Brugger, "Corrugated membranes for improved pattern definition with micro/nanostencil lithography," Sens. Actuators A: Phys., pp. 130-131, pp. 568-574, 2006.
18. O. Vázquez-Mena, G. Villanueva,M. A. F. van den Boogaart, V. Savu, and J. Brugger, "Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching," Microelectron. Eng., vol. 85, pp. 1237-1240, 2008.
19. K. R.Williams and R. S. Muller, "Etch rates for micromachining processing," J. Microelectromech. Syst., vol. 5, pp. 256-269, 1996. (Pubitemid 126607095)
20. K. R.Williams, K. Gupta, andM.Wasilik, "Etch rates formicromachining processing-Part II," J. Microelectromech. Syst., vol. 12, pp. 761-778, 2003.