Dry etching for the correction of gap-induced blurring and improved pattern resolution in nanostencil lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 1, 2007, Pages

  Arcamone, Julien ^a   Sánchez Amores, Ana ^a   Montserrat, Josep ^a   Van Den Boogaart, Marc A F ^b   Brugger, Juergen ^b   Pérez Murano, Francesc ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b EPFL   (Switzerland)

Author keywords

Blurring correction; Complementary metal oxide semiconductor; Dry etching; Nanoelectromechanical systems integration; Nanostencil lithography

Indexed keywords

CMOS INTEGRATED CIRCUITS; DRY ETCHING; NANOLITHOGRAPHY; NEMS; OPTICAL RESONATORS;

BLURRING CORRECTION; NANOMECHANICAL RESONATORS; NANOPATTERNING; NANOSTENCIL LITHOGRAPHY;

MEMS;

ETCHING; LITHOGRAPHY; SEMICONDUCTOR DEVICES;

EID: 34547175818     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2435273     Document Type: Article

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