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Volumn 4, Issue 3, 2012, Pages 773-778

Compliant membranes improve resolution in full-wafer micro/nanostencil lithography

(5) Sidler, Katrin a Villanueva, Luis G a Vazquez Mena, Oscar a Savu, Veronica a Brugger, Juergen a

a EPFL (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT MODELING; NANO-APERTURES; RESOLUTION IMPROVEMENT; SI WAFER; UNEVEN SURFACES; UV LITHOGRAPHY;

LITHOGRAPHY; SILICON; SILICON NITRIDE; SILICON WAFERS;

MEMBRANES;

EID: 84856762864 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c2nr11609j Document Type: Article

Times cited : (15)

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