Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Nanotechnology

Volumn 18, Issue 4, 2007, Pages

  Park, Chan Woo ^a,b   Mena, Oscar Vazquez ^a   Brugger, Jürgen ^a  

^a EPFL   (Switzerland)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COST EFFECTIVENESS; DRY ETCHING; OXIDATION; PHOTOLITHOGRAPHY; SILICON NITRIDE;

EDGE PATTERNED STENCIL; PARALLEL NANOBRIDGE ARRAYS; REVERSE NANOSTENCIL LITHOGRAPHY; REVERSE NANOSTENCIL PROCESS;

NANOSTRUCTURED MATERIALS;

EID: 33846827285     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/4/044002     Document Type: Article

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