Simple technique for direct patterning of nanowires using a nanoslit shadow-mask

TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2007, Pages 191-194

  Tong, H D ^a   Jansen, H V ^a   Tas, N R ^a   Gadgil, V J ^a   Carlen, E T ^a   Van Den Berg, A ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Focused ion beam machining; Nanofabrication; Nanoslit shadow mask; Nanowires

Indexed keywords

ACTUATORS; ELECTRIC WIRE; ION BOMBARDMENT; MICROSYSTEMS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OPTICAL DESIGN; SENSORS; TRANSDUCERS;

DIRECT PATTERNING; FOCUSED-ION-BEAM MACHINING; I-V CHARACTERISTICS; INTERNATIONAL CONFERENCES; LINEAR BEHAVIOR; METALLIC NANOWIRES; NANO-SLITS; NANOFABRICATION; NANOSLIT SHADOW-MASK; SHADOW MASKING; SOLID-STATE SENSORS; WAFER-SCALE;

NANOWIRES;

EID: 50049092955     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2007.4300103     Document Type: Conference Paper

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