Effect of using stencil masks made by focused ion beam milling on permalloy (Ni81Fe19) nanostructures

Nanotechnology

Volumn 24, Issue 11, 2013, Pages

  Bates, J R ^a   Miyahara, Y ^a   Burgess, J A J ^b,c   Iglesias Freire, O ^d   Grutter P ^a  

^a MCGILL UNIVERSITY   (Canada)

^b UNIVERSITY OF ALBERTA   (Canada)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^d INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; ELECTRON BEAM EVAPORATION; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FOCUSED ION BEAM MILLING; KELVIN PROBE FORCE MICROSCOPY; PERMALLOY NANOSTRUCTURES; SILICON NITRIDE MEMBRANE; UNINTENDED CONSEQUENCES;

ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ION IMPLANTATION; MAGNETIC FORCE MICROSCOPY; NANOSTRUCTURES; NICKEL ALLOYS; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

FOCUSED ION BEAMS;

EID: 84874823648     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/11/115301     Document Type: Article

References (37)

1. Chou S Y 1997 Patterned magnetic nanostructures and quantized magnetic disks Proc. IEEE 85 652-71 (Pubitemid 127745584)
2. Martín J I, Nogués J, Liu K, Vicent J L and Schuller I K 2003 Ordered magnetic nanostructures: fabrication and properties J. Magn. Magn. Mater. 256 449-501
3. Ross C A, Smith H I, Savas T, Schattenburg M, Farhoud M, Hwang M, Walsh M, Abraham M C and Ram R J 1999 Fabrication of patterned media for high density magnetic storage J. Vac. Sci. Technol. B 17 3168
4. Deshmukh M M, Ralph D C C, Thomas M and Silcox J 1999 Nanofabrication using a stencil mask Appl. Phys. Lett. 75 1631
5. Brugger J, Berenschot J W, Kuiper S, Nijdam W, Otter B and Elwenspoek M 2000 Resistless patterning of sub-micron structures by evaporation through nanostencils Microelectron. Eng. 53 403-5
6. Vazquez-Mena O, Villanueva L G, Savu V, Sidler K, Langlet P and Brugger J 2009 Analysis of the blurring in stencil lithography Nanotechnology 20 415303
7. Linklater A and Nogami J 2008 Defining nanoscale metal features on an atomically clean silicon surface with a stencil Nanotechnology 19 285302 (Pubitemid 351813747)
8. Fostner S, Burke S A, Topple J, Mativetsky J M, Beerens J and Grutter P 2010 Silicon nanostencils with integrated support structures Microelectron. Eng. 87 652-7
9. Kim G M, van den Boogaart M A F and Brugger J 2003 Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning Microelectron. Eng. 67/68 609-14
10. Egger S, Ilie A, Fu Y, Chongsathien J, Kang D-J and Welland M E 2005 Dynamic shadow mask technique: a universal tool for nanoscience Nano Lett. 5 15-20 (Pubitemid 40173652)
11. Gross L, Schlittler R R, Meyer G, Vanhaverbeke A and Allenspach R 2007 Fabrication of ultrathin magnetic structures by nanostencil lithography in dynamic mode Appl. Phys. Lett. 90 093121 (Pubitemid 46355754)
12. Zahl P, Bammerlin M, Meyer G and Schlittler R R 2005 All-in-one static and dynamic nanostencil atomic force microscopy/scanning tunneling microscopy system Rev. Sci. Instrum. 76 023707 (Pubitemid 40238200)
13. Tsang W T and Cho A Y 1978 Molecular beam epitaxial writing of patterned GaAs epilayer structures Appl. Phys. Lett. 32 491
14. Gross L, Schlittler R R, Meyer G and Allenspach R 2010 Magnetologic devices fabricated by nanostencil lithography Nanotechnology 21 325301
15. Davis J P, Vick D, Li P, Portillo S K N, Fraser A E, Burgess J A J, Fortin D C, Hiebert W K and Freeman M R 2011 Nanomechanical torsional resonator torque magnetometry (invited) J. Appl. Phys. 109 07D309
16. Fraile Rodríguez A, Heyderman L J, Nolting F, Hoffmann A, Pearson J E, Doeswijk L M, van den Boogaart M A F and Brugger J 2006 Permalloy thin films exchange coupled to arrays of cobalt islands Appl. Phys. Lett. 89 142508 (Pubitemid 44522233)
17. Joachim C, Martrou D, Rezeq M, Troadec C, Jie D, Chandrasekhar N and Gauthier S 2010 Multiple atomic scale solid surface interconnects for atom circuits and molecule logic gates. J. Phys.: Condens. Matter 22 084025
18. Guo H, Martrou D, Zambelli T, Polesel-Maris J, Piednoir A, Dujardin E, Gauthier S, van den Boogaart M A F, Doeswijk L M and Brugger J 2007 Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes Appl. Phys. Lett. 90 093113 (Pubitemid 46355747)
19. Döehler G H, Hasnain G and Miller J N 1986 In situ grown-in selective contacts to n-i-p-i doping superlattice crystals using molecular beam epitaxial growth through a shadow mask Appl. Phys. Lett. 49 704
20. Tiggelaar R M, Berenschot J W, Elwenspoek M C, Gardeniers J G E, Dorsman R and Kleijn C R 2007 Spreading of thin-film metal patterns deposited on nonplanar surfaces using a shadow mask micromachined in Si(110) J. Vac. Sci. Technol. B 25 1207 (Pubitemid 47192101)
21. Cojocaru C-V, Harnagea C, Rosei F, Pignolet A, van den Boogaart M A F and Brugger J 2005 Complex oxide nanostructures by pulsed laser deposition through nanostencils Appl. Phys. Lett. 86 183107 (Pubitemid 40861213)
22. Tun T N, Lwin M H T, Kim H H, Chandrasekhar N and Joachim C 2007 Wetting studies on Au nanowires deposited through nanostencil masks Nanotechnology 18 335301 (Pubitemid 47413462)
23. 3 N4 shadow mask Physica E 4 196-200
24. Zhu X and Grutter P 2003 Magnetic force microscopy studies of patterned magnetic structures IEEE Trans. Magn. 39 3420-5
25. Grütter P, Rugar D and Mamin H J 1992 Magnetic force microscopy of magnetic materials Ultramicroscopy 47 393-9 (Pubitemid 23032805)
26. Martin Y and Wickramasinghe H K 1987 Magnetic imaging by 'force microscopy' with 1000 resolution Appl. Phys. Lett. 50 1455
27. Egerton R F 2011 Electron Energy-Loss Spectroscopy in the Electron Microscope (Boston, MA: Springer)
28. Bochkarev V F and Buchin E Yu 2009 The effect of electromagnetic fields on the process of formation of ultrathin Fe-Ni films during their deposition under a plasma-stimulated deposition Russ. Microelectron. 38 165-70
29. Rommel M, Spoldi G, Yanev V, Beuer S, Amon B, Jambreck J, Petersen S, Bauer A J and Frey L 2010 Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques J. Vac. Sci. Technol. B 28 595
30. Spoldi G, Beuer S, Rommel M, Yanev V, Bauer A J and Ryssel H 2009 Experimental observation of FIB induced lateral damage on silicon samples Microelectron. Eng. 86 548-51
31. Fultz B and Howe J M 2008 Transmission Electron Microscopy and Diffractometry of Materials (Heidelberg: Springer)
32. Mativetsky J M, Miyahara Y, Fostner S, Burke S A and Grutter P 2006 Use of an electron-beam evaporator for the creation of nanostructured pits in an insulating surface Appl. Phys. Lett. 88 233121 (Pubitemid 43877773)
33. Jones T, Sawler J and Venus D 1993 Simple, calibrated deposition monitor incorporated into an electron beam evaporator Rev. Sci. Instrum. 64 2008
34. Nonnenmacher M, O'Boyle M P and Wickramasinghe H K 1991 Kelvin probe force microscopy Appl. Phys. Lett. 58 2921
35. Sadewasser S and Glatzel T (ed) 2012 Kelvin Probe Force Microscopy (Springer Series in Surface Sciences) vol 48 (Berlin: Springer)
36. Ingo Flege J, Meyer A, Falta J and Krasovskii E E 2011 Self-limited oxide formation in Ni(111) oxidation Phys. Rev. B 84 115441
37. Atkinson H V 1985 A review of the role of short-circuit diffusion in the oxidation of nickel, chromium, and nickel-chromium alloys Oxid. Met. 24 177-97 (Pubitemid 15585566)