Nanostenciling through a cm2-wide silicon membrane

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 1, 2006, Pages 55-58

  Blech, Vincent ^a   Nobuyuki, Takama ^a   Kim, Beomjoon ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DIFFUSION; ETCHING; EVAPORATION; FABRICATION; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SURFACE CHEMISTRY;

NANOSTENCILING; STENCIL MASK; SURFACE DIFFUSION;

SILICON;

EID: 31544455875     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2140001     Document Type: Article

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