Resistless patterning of sub-micron structures by evaporation through nanostencils

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 403-405

  Brugger, J ^a   Berenschot, J W ^a   Kuiper, S ^a   Nijdam, W ^a   Otter, B ^a   Elwenspoek, M ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; EVAPORATION; GOLD; MEMBRANES; MICROELECTROMECHANICAL DEVICES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICES; SUBSTRATES;

NANOSTENCILS; SILICON NITRIDE MEMBRANES; SUBMICRON SHADOW MASK EVAPORATION; SUBMICRON STRUCTURES;

MICROELECTRONIC PROCESSING;

EID: 0034205553     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00343-9     Document Type: Article

References (8)

1. 1 G.J. Dolan, Appl. Phys. Lett., Vol. 31, No. 5, 1 September 1977
2. 2 S.E. Kubatkin, A.D. Danilov, A.L. Bgdanov, H. Olin, and T. Claeson. Appl. Phys. Lett., Vol. 73, No. 24, 14 December 1998
3. 3 V.T. Petrashov, Microelectronic Engineering 35 (1997) 357-359
4. 4 R. Lüthi, R.R. Schlittler, J. Brugger, P. Vettiger, M.E. Welland, J.K. Gimzewski, Appl. Phys. Lett. Vol. 75, No. 9. 30 August 1999, p. 1314-1316
5. 5 J. Aizenberg, A.J. Black, and G.M. Whitesides, Nature Vol. 394, 27 August 1998
6. 6 S. Fan, M.G. Chapline, N.R. Franklin, T.W. Tombler, A.M. Cassel, H. Dai, Science. Vol. 283, 22 January 1999
7. 7 Cees J.M. van Rijn, Gert J. Veldhuis, Stein Kuiper, Nanotechnology 9 (1998) 343-345
8. 8 J. Brugger, M. Despont, U. Drechsler, H. Rothuizen and P. Vettiger, Eurosensors 12, v1-2, p19-22, 1998, IOP Publishing Ltd, Bristol, England, to be published in Sensors and Actuators