Molecular beam epitaxy of compound materials through shadow masks

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 15, 2004, Pages

  Schallenberg, T ^a   Molenkamp, L W ^a   Karczewski, G ^b  

^a UNIVERSITY OF WÜRZBURG   (Germany)

^b INSTITUTE OF PHYSICS   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC DERIVATIVE; GALLIUM ARSENIDE; INDIUM; INDIUM ARSENIDE; SELENIUM DERIVATIVE; UNCLASSIFIED DRUG; ZINC DERIVATIVE; ZINC SELENIDE;

ANION TRANSPORT; ARTICLE; ATOM; DESORPTION; DIFFUSION; DYNAMICS; GEOMETRY; GROWTH; MATERIALS; MODEL; MOLECULAR BEAM EPITAXY; TECHNOLOGY;

EID: 42749101674     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.155328     Document Type: Article

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