Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 609-614

  Kim, G M ^a,b   Van Den Boogaart, M A F ^a   Brugger, J ^a  

^a EPFL   (Switzerland)

^b Kyungpook National University   (South Korea)

Author keywords

Focused ion beam milling; MEMS technology; Nanoengineering; Nanostencil; Shadow mask deposition

Indexed keywords

ALUMINUM; DEPOSITION; ION BEAM LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MILLING (MACHINING); NANOTECHNOLOGY; PLASMA ETCHING; SILICON NITRIDE;

SHADOW MASK DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 0038696519     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00121-7     Document Type: Conference Paper

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