Dynamic stencil lithography on full wafer scale

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2054-2058

  Savu, Veronica ^a   Van Den Boogaart, Marc A F ^a   Brugger, Juergen ^a   Arcamone, Julien ^b   Sansa, Marc ^b   Perez Murano, Francesc ^b  

^a EPFL   (Switzerland)

^b INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS MODES; DYNAMIC MODES; IN-SITU; LITHOGRAPHY TOOLS; MATERIAL DEPOSITIONS; VACUUM CHAMBERS; WAFER SCALES;

VACUUM DEPOSITION;

EID: 57249086389     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2987953     Document Type: Article

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