Nanofabrication using a stencil mask

Applied Physics Letters

Volumn 75, Issue 11, 1999, Pages 1631-1633

  Deshmukh, Mandar M ^a   Ralph, D C ^a   Thomas, M ^a   Silcox, J ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; EVAPORATION; IMAGE ANALYSIS; IMAGE QUALITY; MASKS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SUBSTRATES; THERMAL STRESS; TRANSMISSION ELECTRON MICROSCOPY;

FULL WIDTH AT HALF MAXIMUM (FWHM); IMAGE ANALYSIS; STENCIL MASKS;

NANOTECHNOLOGY;

EID: 0032606877     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124777     Document Type: Article

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