Magnetologic devices fabricated by nanostencil lithography

Nanotechnology

Volumn 21, Issue 32, 2010, Pages

  Gross, L ^a   Schlittler, R R ^a   Meyer, G ^a   Allenspach, R ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR DISTRIBUTIONS; IN-SITU; NANOSTENCILS; QUANTUM CELLULAR AUTOMATA; SHADOW MASKING;

ATOMIC FORCE MICROSCOPY; CELLULAR AUTOMATA; FABRICATION; MAGNETIC ANISOTROPY; MAGNETIC FORCE MICROSCOPY; PATTERN RECOGNITION SYSTEMS;

MAGNETIC LOGIC DEVICES;

EID: 77957300852     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/32/325301     Document Type: Article

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