Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes

Applied Physics Letters

Volumn 90, Issue 9, 2007, Pages

  Guo, Haiming ^a   Martrou, David ^a   Zambelli, Tomaso ^a   Polesel Maris, Jérôme ^a   Piednoir, Agnès ^a   Dujardin, Erik ^a   Gauthier, Sébastien ^a   Van Den Boogaart, Marc A F ^b   Doeswijk, Lianne M ^b   Brugger, Jürgen ^b  

^a CEMES CNRS   (France)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; IMAGING SYSTEMS; LITHOGRAPHY; SILICON NITRIDE; ULTRAHIGH VACUUM;

NANOPATTERNS; NANOSTENCILING; STATIC STENCIL DEPOSITION; STENCIL LITHOGRAPHY;

MICROELECTRODES;

EID: 33847616903     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2710473     Document Type: Article

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