SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Journal of Vacuum Science and Technology B

Volumn 29, Issue 2, 2011, Pages

  Klein, Mona J K ^a   Montagne, Franck ^a   Blondiaux, Nicolas ^a   Vazquez Mena, Oscar ^b   Heinzelmann, Harry ^a   Pugin, Raphael ^a   Brugger, Juergen ^b   Savu, Veronica ^b  

^a CSEM   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; LITHOGRAPHY; MEMBRANES; MICROFILTRATION; NANOSPHERES; POTASSIUM HYDROXIDE; SILICON NITRIDE;

APPLICATION SPECIFIC; LIFT-OFF PROCEDURES; NANO SPHERE LITHOGRAPHY; OXYGEN PLASMAS; POLYMERIC COATINGS; POLYSTYRENE BEADS; SILICON NITRIDE (SIN); WAFER SCALE FABRICATION;

SILICON WAFERS;

EID: 79953771927     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3554404     Document Type: Article

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