Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2772-2775

  Park, Chan Woo ^a,b   Vazquez Mena, Oscar ^a   Van Den Boogaart, Marc A F ^a   Brugger, Jürgen ^a  

^a EPFL   (Switzerland)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CHROMIUM COMPOUNDS; LITHOGRAPHY; SILICON COMPOUNDS; SUBSTRATES;

NANOSTENCIL LITHOGRAPHY; NANOSTENCIL PATTERNS; PATTERN STRUCTURES; REVERSE TRANSFER;

NANOSTRUCTURED MATERIALS;

EID: 33845277615     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2366610     Document Type: Article

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