Stenciled conducting bismuth nanowires

Journal of Vacuum Science and Technology B

Volumn 28, Issue 1, 2010, Pages 169-172

  Savu, Veronica ^a   Neuser, Sam ^a   Villanueva, Guillermo ^a   Vazquez Mena, Oscar ^a   Sidler, Katrin ^a   Brugger, Juergen ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BISMUTH; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; THERMAL EVAPORATION;

ATOMIC-FORCE-MICROSCOPY; BI NANOWIRES; BISMUTH NANOWIRES; CONTACT PADS; ELECTRICAL CHARACTERIZATION; ELECTRICAL CONTACT RESISTANCE; NANOWIRE STRUCTURES; PHYSICAL VAPOUR DEPOSITION; STENCIL LITHOGRAPHY; STENCIL MASKS;

NANOWIRES;

EID: 77949346988     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3292630     Document Type: Conference Paper

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