Mechanical stabilisation and design optimisation of masks for stencil lithography: Numerical approach and experimental validation

Microelectronic Engineering

Volumn 85, Issue 11, 2008, Pages 2243-2249

  Lishchynska, Maryna ^a   van den Boogaart, Marc A F ^b   Savu, Veronica ^b   Greer, J C ^a   Brugger, Juergen ^b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b EPFL   (Switzerland)

Author keywords

MEMS; Modelling; Stencil lithography; Stencil stabilization, simulation; Stress induced deformation

Indexed keywords

DEFORMATION; LITHOGRAPHY; SENSOR NETWORKS; SILICON;

MEMS; MODELLING; STENCIL LITHOGRAPHY; STENCIL STABILIZATION, SIMULATION; STRESS-INDUCED DEFORMATION;

DESIGN;

EID: 53849086474     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.07.009     Document Type: Article

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