Resistless fabrication of nanoimprint lithography (NIL) stamps using nano-stencil lithography

Micromachines

Volumn 4, Issue 4, 2013, Pages 370-377

  Villanueva, Luis Guillermo ^a   Vazquez Mena, Oscar ^a   Martin OlmosC , Cristina ^a   Savu, Veronica ^b   Sidler, Katrin ^a   Brugger, Juergen ^a  

^a EPFL   (Switzerland)

^b UNIVERSITY OF BASEL   (Switzerland)

Author keywords

Nanoimprint lithography; Nanostencil lithography; Nanowires

Indexed keywords

COST-EFFICIENT; MEMBRANE APERTURE; METALLIC NANOWIRES; NANOSTENCIL LITHOGRAPHIES; STENCIL LITHOGRAPHY;

FABRICATION; NANOWIRES;

NANOIMPRINT LITHOGRAPHY;

EID: 84891543830     PISSN: None     EISSN: 2072666X     Source Type: Journal    
DOI: 10.3390/mi4040370     Document Type: Article

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