Silicon-supported membranes for improved large-area and high-density micro/nanostencil lithography

Journal of Microelectromechanical Systems

Volumn 15, Issue 6, 2006, Pages 1663-1670

  van den Boogaart, Marc A F ^a   Doeswijk, Lianne M ^a   Brugger, Jürgen ^a  

^a EPFL   (Switzerland)

Author keywords

Local deposition; Mechanical stabilization; Nanostencil; Shadow mask; Stencil lithography; Stress induced deformation

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFORMATION; MASKS; MICROELECTROMECHANICAL DEVICES; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SOLID STATE DEVICES;

LOCAL DEPOSITION; MECHANICAL STABILIZATION; NANOSTENCIL LITHOGRAPHY; SHADOW MASK LITHOGRAPHY; STRESS-INDUCED DEFORMATION;

LITHOGRAPHY;

EID: 33746322150     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2006.885981     Document Type: Article

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