Multi-beam interference advances and applications: Nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures

Micromachines

Volumn 2, Issue 2, 2011, Pages 221-257

  Burrowg, Guy M ^a   Gaylord, Thomas K ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Biomedical structures; Interference lithography; Metamaterials; Multi beam interference; Nano electronics; Optical trapping; Photonic crystals; Subwavelength structures

Indexed keywords

INTERFERENCE LITHOGRAPHY; MULTIBEAM INTERFERENCES; NANO SCALE; OPTICALTRAPPING; SUB-WAVELENGTH; SUB-WAVELENGTH STRUCTURES;

NANOELECTRONICS; PHOTONIC CRYSTALS;

METAMATERIALS;

EID: 84863505213     PISSN: None     EISSN: 2072666X     Source Type: Journal    
DOI: 10.3390/mi2020221     Document Type: Review

References (283)

1. Cressler, J.D. Silicon Earth: Introduction to the Microelectronics and Nanotechnology Revolution; Cambridge University Press: New York, NY, USA, 2009.
2. Rothschild, M. Nanopatterning with UV optical lithography. Mater. Res. Soc. Bull. 2005, 30, 942-946.
3. Jang, J.H.; Ullal, C.K.; Maldovan, M.; Gorishnyy, T.; Kooi, S.; Koh, C.Y.; Thomas, E.L. 3D micro-and nanostructures via interference lithography. Adv. Funct. Mater. 2007, 17, 3027-3041.
4. Jhaveri, T.; Strojwas, A.; Pileggi, L.; Rovner, V. Economic assessment of lithography strategies for the 22nm technology node. Proc. SPIE 2009, 7488, 74882Y.
5. Smith, B.W. Alternative optical technologies: More than curiosities? Proc. SPIE 2009, 7274, 727402.
6. Solak, H.H. Nanolithography with coherent extreme ultraviolet light. J. Phys. D Appl. Phys. 2006, 39, R171-R188.
7. Moon, J.H.; Ford, J.; Yang, S. Fabricating three-dimensional polymeric photonic structures by multi-beam interference lithography. Polym. Adv. Technol. 2006, 17, 83-93.
8. Xia, D.; Ku, Z.; Lee, S.C.; Brueck, S.R.J. Nanostructures and functional materials fabricated by Interferometric lithography. Adv. Mater. 2011, 23, 147-179.
9. Saleh, B.E.A.; Teich, M.C. Fundamentals of Photonics; John Wiley & Sons, INC.: New York, NY, USA, 1991.
10. Cai, L.Z.; Yang, X.L.; Wang, Y.R. Formation of a microfiber bundle by interference of three noncoplanar beams. Opt. Lett. 2001, 26, 1858-1860.
11. Mao, W.D.; Zhong, Y.C.; Dong, J.W.; Wang, H.Z. Crystallography of two-dimensional photonic lattices formed by holography of three noncoplanar beams. J. Opt. Soc. Am. B 2005, 22, 1085-1091.
12. Cai, L.Z.; Yang, X.L.; Wang, Y.R. All fourteen Bravais lattices can be formed by interference of four noncoplanar beams. Opt. Lett. 2002, 27, 900-902.
13. Turberfield, A.J. Photonic crystals made by holographic lithography. MRS Bull. 2001, 26, 632-636.
14. Mei, D.; Cheng, B.; Hu, W.; Li, Z.; Zhang, D. Three-dimensional ordered patterns by light interference. Opt. Lett. 1995, 20, 429-431.
15. Petsas, A.I.; Coates, A.B.; Grynberg, G. Crystallography of optical lattices. Phys. Rev. A 1994, 50, 5173-5189.
16. Ono, Y.; Ochi, T. All fourteen Bravais lattices can be fabricated by triple exposure of two-beam interference fringes. Proc. SPIE 2006, 6327, 632709.
17. Dwivedi, A.; Xavier, J.; Joseph, J.; Singh, K. Formation of all fourteen Bravais lattices of three-dimensional photonic crystal structures by a dual beam multiple-exposure holographic technique. Appl. Opt. 2008, 47, 1973-1980.
18. Wu, L.J.; Zhong, Y.C.; Wong, K.S.; Wang, G.P.; Yuan, L. Fabrication of hetero-binary and honeycomb photonic crystals by one-step holographic lithography. Appl. Phys. Lett. 2006, 88, 09115.
19. Solak, H.H. Space-invariant multiple-beam achromatic EUV interference lithography. Microelectron. Eng. 2005, 78-79, 410-416.
20. Jimenez-Ceniceros, A.; Trejo-Duran, M.; Alvarado-Mendez, E.; Castano, V.M. Extinction zones and scalability in N-beam interference lattices. Opt. Commun. 2010, 283, 362-367.
21. Mao, W.D.; Dong, J.W.; Zhong, Y.C.; Liang, G.Q.; Wang, H.Z. Formation principles of two-dimensional compound photonic lattices by one-step holographic lithography. Opt. Express 2005, 13, 2994-2999.
22. Chan, T.Y.M.; Toader, O.; John, S. Photonic band gap templating using optical interference lithography. Phys. Rev. E 2005, 71, 046605.
23. Dedman, E.R.; Sharp, D.N.; Turberfield, A.J.; Blanford, C.F.; Denning, R.G. Photonic crystals with a chiral basis by holographic lithography. Photonics Nanostruct. 2005, 3, 79-83.
24. Lai, N.D.; Lin, J.H.; Hsu, C.C. Fabrication of highly rotational symmetric quasi-periodic structures by multiexposure of a three-beam interference technique. Appl. Opt. 2007, 46, 5645-5648.
25. Juodkazis, S.; Mizeikis, V.; Misawa, H. Three-dimensional microfabrication of materials by femtosecond lasers for photonics applications. J. Appl. Phys. 2009, 106, 051101.
26. Zaccaria, R.P.; Shoji, S.; Sun, H.B.; Kawata, S. Multi-shot interference approach for any kind of Bravais lattice. Appl. Phys. B 2008, 93, 251-256.
27. Tam, W.Y. Icosahedral quasicrystals by optical interference holography. Appl. Phys. Lett. 2006, 89, 251111.
28. Stay, J.L.; Gaylord, T.K. Conditions for primitive-lattice-vector-direction equal contrasts in four-beam-interference lithography. Appl. Opt. 2009, 48, 4801-4813.
29. Ullal, C.K.; Maldovan, M.; Wohlgemuth, M.; Thomas, E.L.; White, C.A.; Yang, S. Triply periodic bicontinuous structures through interference lithography: A level-set approach. J. Opt. Soc. Am. A 2003, 20, 948-954.
30. Yang, X.L.; Cai, L.Z.; Wang, Y.R.; Dong, G.Y.; Shen, X.X.; Meng, X.F.; Hu, Y. Large complete bandgaps in a two-dimensional square photonic crystal with isolated single-atom dielectric rods in air. Nanotechnology 2008, 19, 025201-025201.
31. Moon, J.H.; Pine, D.J.; Yang, S.-M. Fabrication of two-dimensional photonic crystals of non-spherical atoms by holographic lithography. In Proceedings of Photonic Crystal Materials and Nanostructures, Strasbourg, France, 27-29 April 2004; pp. 95-99.
32. Quinonez, F.; Menezes, J.W.; Cescato, L.; Rodriguez-Esquerre, V.F.; Hernandez-Figueroa, H.; Mansano, R.D. Band gap of hexagonal 2D photonic crystals with elliptical holes recorded by interference lithography. Opt. Express 2006, 14, 4873-4879.
33. Hung, Y., Jr.; Lee, S.-L.; Pan, Y.-T. Photonic bandgap analysis of photonic crystal slabs with elliptical holes and their formation with laser holography. J. Opt. 2010, 12, 015102.
34. Ao, X.; He, S. Two-stage design method for realization of photonic bandgap structures with desired symmetries by interference lithography. Opt. Express 2004, 12, 978-983.
35. Chanda, D.; Abolghasemi, L.; Herman, P.R. Numerical band calculation of holographically formed periodic structures with irregular motif. Proc. SPIE 2006, 6128, 61281E.
36. Qiu, M.; He, S. Optimal design of a two-dimensional photonic crystal of square lattice with a large complete two-dimensional bandgap. J. Opt. Soc. Am. B 2000, 17, 1027-1030.
37. Qi, L.M.; Yang, Z.Q.; Gao, X.; Liu, W.X.; Liang, Z. Research on three types of rhombus lattice photonic band structures. J. Electromagn. Waves Appl. 2008, 22, 1155-1164.
38. Pu, Y.-Y.; Liang, G.-Q.; Mao, W.-D.; Dong, J.-W.; Wang, H.-Z. Fabrication of two-dimensional photonic crystals with triangular rods by single-exposure holographic lithography. Chin. Phys. Lett. 2007, 24, 983-985.
39. Cai, L.Z.; Dong, G.Y.; Feng, C.S.; Yang, X.L.; Shen, X.X.; Meng, X.F. Holographic design of a two-dimensional photonic crystal of square lattice with a large two-dimensional complete bandgap. J. Opt. Soc. Am. B 2006, 23, 1708-1711.
40. Wang, R.; Wang, X.-H.; Gu, B.-Y.; Yang, G.-Z. Effects of shapes and orientations of scatterers and lattice symmetries on the photonic band gap in two-dimensional photonic crystals. J. Appl. Phys. 2001, 90, 4307-4313.
41. Cai, L.Z.; Shen, X.X.; Yang, X.L.; Dong, G.Y.; Meng, X.F.; Xu, X.F.; Wang, Y.R. Holographic design of hexagonal photonic crystals of irregular columns with large full band gap. Opt. Commun. 2006, 267, 305-309.
42. Yang, X.L.; Cai, L.Z.; Wang, Y.R.; Feng, C.S.; Dong, G.Y.; Shen, X.X.; Meng, X.F.; Hu, Y. Optimization of band gap of photonic crystals fabricated by holographic lithography. Europhys. Lett. 2008, 81, 14001.
43. Chien, C.W.; Lee, Y.C.; Lee, P.S.; Chang, J.Y.; Chen, J.C. Analysis of a two-dimensional photonic bandgap structure fabricated by an interferometric lithographic system. Appl. Opt. 2007, 46, 3196-3204.
44. Ohlinger, K.; Lin, Y.K.; Qualls, J.S. Maximum and overlapped photonic band gaps in both transverse electric and transverse magnetic polarizations in two-dimensional photonic crystals with low symmetry. J. Appl. Phys. 2009, 106, 063520.
45. Li, Z.-Y.; Wang, J.; Gu, B.Y. Full band gap in fcc and bcc photonic band gaps structure: Non-spherical atom. J. Phys. Soc. Jpn. 1998, 67, 3288-3291.
46. Kang, H.K.; Lee, K.H.; Wong, C.C.; Romanato, F. ID to 2D transitional structure of plasmonic crystals: fabrication and characterization. Appl. Phys. B 2009, 97, 671-677.
47. Noda, S. Photonic crystal lasers-ultimate nanolasers and broad-area coherent lasers. J. Opt. Soc. Am. B Opt. Phys. 2010, 27, B1-B8.
48. Noda, S.; Yokoyama, M.; Imada, M.; Chutinan, A.; Mochizuki, M. Polarization mode control of two-dimensional photonic crystal laser by unit cell structure design. Science 2001, 293, 1123-1125.
49. Hu, B.; Lu, M.; Li, W.; Zou, K.; Zhou, Z.; Lin, A.; Li, N. High birefringent rhombic-hole photonic crystal fibers. Appl. Opt. 2010, 49, 6098-6101.
50. Jang, J.; Jhaveri, S.J.; Rasin, B.; Koh, C.; Ober, C.K.; Thomas, E.L. Three-dimensionally-patterned submicrometer-scale hydrogel/air networks that offer a new platform for biomedical applications. Nano Lett. 2008, 8, 1456-1460.
51. Huang, J.; Beckemper, S.; Gillner, A.; Wang, K. Tunable surface texturing by polarizationcontrolled three-beam interference. J. Micromech. Microeng. 2010, 20, 095004.
52. Vavassori, P.; Donzelli, O.; Metlushko, V.; Grimsditch, M.; Ilic, B.; Neuzil, P.; Kumar, R. Magnetic switching in submicron-scale periodic magnetic arrays. J. Appl. Phys. 2000, 88, 999-1003.
53. Tang, Z.X.; Peng, R.W.; Fan, D.Y.; Wen, S.C.; Zhang, H.; Qian, L.J. Absolute left-handed behaviors in a triangular elliptical-rod photonic crystal. Opt. Express 2005, 13, 9796-9803.
54. Shen, X.X.; Yang, X.L.; Cai, L.Z.; Dong, G.Y.; Meng, X.F.; Xu, X.F.; Wang, Y.R. Negative refractions in two-dimensional photonic crystals formed by holographic lithography. Opt. Express 2007, 15, 8003-8009.
55. Yuan, L.; Wang, G.P.; Huang, X.K. Arrangements of four beams for any Bravais lattice. Opt. Lett. 2003, 28, 1769-1771.
56. Li, E.B.; Xi, J.T.; Chicharo, J. Predication of multi-dimensional photonic crystal structures generated by multi-beam interference in holographic lithography. Smart Mater. Struct. 2006, 15, 158-164.
57. Do, D.B.; Lai, N.D.; Wu, C.Y.; Lin, J.H.; Hsu, C.C. Fabrication of ellipticity-controlled microlens arrays by controlling the parameters of the multiple-exposure two-beam interference technique. Appl. Opt. 2011, 50, 579-585.
58. Menezes, J.W.; Cescato, L. Recording different geometries of 2D hexagonal photonic crystals by choosing the phase between two-beam interference exposures. Opt. Express 2006, 14, 8578-8583.
59. Burrow, G.M.; Gaylord, T.K. Constrained parametric optimization of point geometries in multi-beam-interference lithography. In Proceedings of Frontiers in Optics 2010, Rochester, NY, USA, 27 October 2010.
60. Yang, X.L.; Cai, L.Z.; Liu, Q. Polarization optimization in the interference of four umbrellalike symmetric beams for making three-dimensional periodic microstructures. Appl. Opt. 2002, 41, 6894-6900.
61. Su, H.M.; Zhong, Y.C.; Wang, X.; Zheng, X.G.; Xu, J.F.; Wang, H.Z. Effects of polarization on laser holography for microstructure fabrication. Phys. Rev. E 2003, 67, 056619.
62. Fernandez, A.; Decker, J.Y.; Herman, S.M.; Phillion, D.W.; Sweeney, D.W.; Perry, M.D. Methods for fabricating arrays of holes using interference lithography. J. Vac. Sci. Technol. B 1997, 15, 2439-2443.
63. Fernandez, A.; Phillion, D.W. Effects of phase shifts on four-beam interference patterns. Appl. Opt. 1998, 37, 473-478.
64. Ellman, M.; Rodriguez, A.; Perez, N.; Echeverria, M.; Verevkin, Y.K.; Peng, C.S.; Berthou, T.; Wang, Z.; Olaizola, S.M.; Ayerdi, I. High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation. Appl. Surf. Sci. 2009, 255, 5537-5541.
65. Stay, J.L.; Gaylord, T.K. Contrast in four-beam-interference lithography. Opt. Lett. 2008, 33, 1434-1436.
66. Chanda, D.; Abolghasemi, L.E.; Herman, P.R. Single laser exposure fabrication of diamond-like 3-dimensional photonic crystal microstructures using circularly polarized light. Appl. Phys. A 2008, 93, 33-37.
67. Meisel, D.C.; Wegener, M.; Busch, K. Three-dimensional photonic crystals by holographic lithography using the umbrella configuration: symmetries and complete photonic band gaps. Phys. Rev. B 2004, 70, 165104.
68. Cai, L.Z.; Yang, X.L.; Wang, Y.R. Interference of three noncoplanar beams: Patterns, contrast and polarization optimization. J. Mod. Opt. 2002, 49, 1663-1672.
69. Cai, L.Z.; Yang, X.L. Interference of circularly polarized light: contrast and application in fabrication of three-dimensional periodic microstructures. Opt. Laser Technol. 2002, 34, 671-674.
70. Yang, X.L.; Cai, L.Z. Wave design of the interference of three noncoplanar beams for microfiber fabrication. Opt. Commun. 2002, 208, 293-297.
71. Yang, X.L.; Cai, L.Z. Wave design and polarization optimization in the interference of four non-coplanar beams for making three-dimensional periodical microstructures. J. Mod. Opt. 2003, 50, 1445-1453.
72. Yang, X.L.; Cai, L.Z.; Wang, Y.R.; Liu, Q. Interference of four umbrellalike beams by a diffractive beam splitter for fabrication of two-dimensional square and trigonal lattices. Opt. Lett. 2003, 28, 453-455.
73. Stay, J.L.; Gaylord, T.K. Three-beam-interference lithography: Contrast and crystallography. Appl. Opt. 2008, 47, 3221-3230.
74. Stay, J.L. Multi-Beam-Interference-Based Methodology for the Fabrication of Photonic Crystal Structures. Ph.D. Thesis, Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA, USA, 2009.
75. Salaun, M.; Audier, M.; Duneau, M.; Delyon, F. Holographic lithography of a two-dimensional hexagonal structure: effect of beam polarization. Appl. Surf. Sci. 2007, 254, 850-854.
76. Lasagni, A.F.; Dajun, Y.; Das, S. Layer-by-layer interference lithography of three-dimensional microstructures in SU-8. Adv. Eng. Mater. 2009, 11, 408-411.
77. Pang, L.; Nakagawa, W.; Fainman, Y. Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write. Appl. Opt. 2003, 42, 5450-5456.
78. Pati, G.S.; Heilmann, R.K.; Konkola, P.T.; Joo, C.; Chen, C.G.; Murphy, E.; Schattenburg, M.L. Generalized scanning beam interference lithography system for patterning gratings with variable period progressions. J. Vac. Sci. Technol. B 2002, 20, 2617-2621.
79. Gutierrez-Rivera, L.E.; Cescato, L. SU-8 submicrometric sieves recorded by UV interference lithography. J. Micromech. Microeng. 2008, 18, 115003.
80. Gauthier, R.C.; Mnaymneh, K.W. Design of photonic band gap structures through a dual-beam multiple exposure technique. Opt. Laser Technol. 2004, 36, 625-633.
81. Moormann, C.; Bolten, J.; Kurz, H. Spatial phase-locked combination lithography for photonic crystal devices. In Proceedings of 29th International Conference on Micro and Nano Engineering, Delft, The Netherlands, 22-25 September 2003; pp. 417-422.
82. Lee, F.Y.; Fung, K.H.; Tang, T.L.; Tam, W.Y.; Chan, C.T. Fabrication of gold nano-particle arrays using two-dimensional templates from holographic lithography. Curr. Appl. Phys. 2009, 9, 820-825.
83. Dyachenko, P.N.; Karpeev, S.V.; Fesik, E.V.; Miklyaev, Y.V.; Pavelyev, V.S.; Malchikov, G.D. The three-dimensional photonic crystals coated by gold nanoparticles. Opt. Commun. 2011, 284, 885-888.
84. MacLeod, B.D.; Kelsey, A.F.; Leclerc, M.A.; Resler, D.P.; Liberman, S.; Nole, J.P. Fully automated interference lithography. In Proceedings of Emerging Lithographic Technologies VI, Santa Clara, CA, USA, 5-7 March 2002; pp. 910-921.
85. Rodriguez, A.; Echeverria, M.; Ellman, M.; Perez, N.; Verevkin, Y.K.; Peng, C.S.; Berthou, T.; Zuobin, W.; Ayerdi, I.; Savall, J.; Olaizola, S.M. Laser interference lithography for nanoscale structuring of materials: From laboratory to industry. Microelectron. Eng. 2009, 86, 937-940.
86. Lu, C.; Hu, X.K.; Dimov, S.S.; Lipson, R.H. Controlling large-scale film morphology by phase manipulation in interference lithography. Appl. Opt. 2007, 46, 7202-7206.
87. Xie, X.S.; Li, M.; Guo, J.; Liang, B.; Wang, Z.X.; Sinitskii, A.; Xiang, Y.; Zhou, J.Y. Phase manipulated multi-beam holographic lithography for tunable optical lattices. Opt. Express 2007, 15, 7032-7037.
88. Kondo, T.; Matsuo, S.; Juodkazis, S.; Misawa, H. Femtosecond laser interference technique with diffractive beam splitter for fabrication of three-dimensional photonic crystals. Appl. Phys. Lett. 2001, 79, 725-727.
89. Pissadakis, S.; Pappas, C. Planar periodic structures fabricated in Er/Yb-codoped phosphate glass using multi-beam ultraviolet laser holography. Opt. Express 2007, 15, 4296-4303.
90. Levine, Z.H.; Grantham, S.; Lucatorto, T.B. Design considerations for a cascaded grating interferometer suitable for extreme ultraviolet interference lithography. J. Microlith. Microfab. Microsys. 2009, 8, 021202.
91. Klein-Wiele, J.H.; Simon, P. Fabrication of periodic nanostructures by phase-controlled multiple-beam interference. Appl. Phys. Lett. 2003, 83, 4707-4709.
92. Savas, T.A.; Shah, S.N.; Schattenburg, M.L.; Carter, J.M.; Smith, H.I. Achromatic interferometric lithography for 100-nm-period gratings and grids. J. Vac. Sci. Technol. B 1995, 13, 2732-2735.
93. Cai, L.Z.; Yang, X.L.; Liu, Q.; Wang, Y.R. What kind of Bravais lattices can be made by the interference of four umbrellalike beams? Opt. Commun. 2003, 224, 243-246.
94. Yang, X.L.; Cai, L.Z.; Wang, Y.R.; Liu, Q. Interference technique by three equal-intensity umbrellalike beams with a diffractive beam splitter for fabrication of two-dimensional trigonal and square lattices. Opt. Commun. 2003, 218, 325-332.
95. Tam, W.Y. Woodpile and diamond structures by optical interference holography. J. Opt. A Pure Appl. Opt. 2007, 9, 1076-1081.
96. Dong, G.Y.; Cai, L.Z.; Yang, X.L.; Shen, X.X.; Meng, X.F.; Xu, X.F.; Wang, Y.R. Holographic design and band gap evolution of photonic crystals formed with five-beam symmetric umbrella configuration. Opt. Express 2006, 14, 8096-8102.
97. Pang, Y.K.; Lee, J.C.W.; Ho, C.T.; Tam, W.Y. Realization of woodpile structure using optical interference holography. Opt. Express 2006, 14, 9113-9119.
98. Brundrett, D.L.; Gaylord, T.K.; Glytsis, E.N. Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: Design and fabrication. Appl. Opt. 1998, 37, 2534-2541.
99. Stay, J.L.; Burrow, G.M.; Gaylord, T.K. Three-beam interference lithography methodology. Rev. Sci. Instrum. 2011, 82, 023115.
100. Mai, X.; Moshrefzadeh, R.; Gibson, U.J.; Stegeman, G.I.; Seaton, C.T. Simple versatile method for fabricating guided-wave gratings. Appl. Opt. 1985, 24, 3155-3161.
101. Guan, Y.; Pedraza, A.J. Synthesis and characterization of self-organized nanostructure arrays generated by laser irradiation. Mat. Res. Soc. Symp. Proc. 2004, 818, 335-340.
102. de Boor, J.; Geyer, N.; Gosele, U.; Schmidt, V. Three-beam interference lithography: Upgrading a Lloyd's interferometer for single-exposure hexagonal patterning. Opt. Lett. 2009, 34, 1783-1785.
103. de Boor, J.; Dong Sik, K.; Schmidt, V. Sub-50nm patterning by immersion interference lithography using a Littrow prism as a Lloyd's interferometer. Opt. Lett. 2010, 35, 3450-3452.
104. Rizvi, N.H.; Gower, M.C. Production of submicrometer period Bragg gratings in optical fibers using wavefront division with a biprism and an excimer laser source. Appl. Phys. Lett. 1995, 67, 739-741.
105. Xiang, W.; Liang, J.; Zhang, G.; Wu, L.; Wong, K.S.; Wong, G.K.L. Non-coplanar multi-beam interference produced by one triangular pyramid for fabricating photonic crystals. Chin. Opt. Lett. 2005, 3, 712-714.
106. Zhong, Y.C.; Wu, L.J.; Su, H.M.; Wong, K.S.; Wang, H.Z. Fabrication of photonic crystals with tunable surface orientation by holographic lithography. Opt. Express 2006, 14, 6837-6843.
107. Lei, M.; Yao, B.; Rupp, R.A. Structuring by multi-beam interference using symmetric pyramids. Opt. Express 2006, 14, 5803-5811.
108. Miklyaev, Y.V.; Meisel, D.C.; Blanco, A.; von Freymann, G.; Busch, K.; Koch, W.; Enkrich, C.; Deubel, M.; Wegener, M. Three-dimensional face-centered-cubic photonic crystal templates by laser holography: Fabrication, optical characterization, and band-structure calculations. Appl. Phys. Lett. 2003, 82, 1284-1286.
109. Ullal, C.K.; Maldovan, M.; Thomas, E.L.; Chen, G.; Han, Y.J.; Yang, S. Photonic crystals through holographic lithography: Simple cubic, diamond-like, and gyroid-like structures. Appl. Phys. Lett. 2004, 84, 5434-5436.
110. Lin, C.H.; Zhu, Z.H.; Lo, Y.H. New grating fabrication technology for optoelectronic devices: Cascaded self-induced holography. Appl. Phys. Lett. 1995, 67, 3072-3074.
111. Berger, V.; Gauthier-Lafaye, O.; Costard, E. Photonic band gaps and holography. J. Appl. Phys. 1997, 82, 60-64.
112. Divliansky, I.B.; Shishido, A.; Khoo, I.C.; Mayer, T.S.; Pena, D.; Nishimura, S.; Keating, C.D.; Mallouk, T.E. Fabrication of two-dimensional photonic crystals using interference lithography and electrodeposition of CdSe. Appl. Phys. Lett. 2001, 79, 3392-3394.
113. Lin, Y.; Herman, P.R. Effect of structural variation on the photonic band gap in woodpile photonic crystal with body-centered-cubic symmetry. J. Appl. Phys. 2005, 98, 63104-63101.
114. Schneider, G.J.; Wetzel, E.D.; Murakowski, J.A.; Prather, D.W. Fabrication of three-dimensional "Yablonovite" photonic crystals by multiple-exposure UV interference lithography. In Proceedings of Micromachining Technology for Micro-Optics and Nano-Optics III, San Jose, CA, USA, 25-27 January 2005; pp. 9-17.
115. Chelnokov, A.; Rowson, S.; Lourtioz, J.M.; Berger, V.; Courtois, J.Y. An optical drill for the fabrication of photonic crystals. J. Opt. A Pure Appl. Opt. 1999, 1, 3-6.
116. Divliansky, I.; Mayer, T.S.; Holliday, K.S.; Crespi, V.H. Fabrication of three-dimensional polymer photonic crystal structures using single diffraction element interference lithography. Appl. Phys. Lett. 2003, 82, 1667-1669.
117. Okai, M.; Tsuji, S.; Chinone, N.; Harada, T. Novel method to fabricate corrugation for a lambda/4-shifted distributed feedback laser using a grating photomask. Appl. Phys. Lett. 1989, 55, 415-417.
118. Jeon, S.; Park, J.; Cirelli, R.; Yang, S.; Heitzman, C.; Braun, P.; Kenis, P.; Rogers, J. Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks. PNAS 2004, 101, 12428-12433
119. Lin, Y.; Herman, P.R.; Abolghasemi, E.L. Proposed single-exposure holographic fabrication of microsphere-type photonic crystals through phase-mask techniques. J. Appl. Phys. 2005, 97, 096102.
120. Lin, Y.; Herman, P.R.; Darmawikarta, K. Design and holographic fabrication of tetragonal and cubic photonic crystals with phase mask: Toward the mass-production of three-dimensional photonic crystals. Appl. Phys. Lett. 2005, 86, 071117.
121. Hill, K.O.; Malo, B.; Bilodeau, F.; Johnson, D.C.; Albert, J. Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask. Appl. Phys. Lett. 1993, 62, 1035-1037.
122. Chanda, D.; Abolghasemi, L.; Herman, P.R. One-dimensional diffractive optical element based fabrication and spectral characterization of three-dimensional photonic crystal templates. Opt. Express 2006, 14, 8568-8577.
123. Lin, Y.; Rivera, D.; Chen, K.P. Woodpile-type photonic crystals with orthorhombic or tetragonal symmetry formed through phase mask techniques. Opt. Express 2006, 14, 887-892.
124. Chan, T.Y.M.; Toader, O.; John, S. Photonic band-gap formation by optical-phase-mask lithography. Phys. Rev. E 2006, 73, 46610-46611.
125. Chanda, D.; Herman, P.R. Two-dimensional diffractive optical element based fabrication of 3D photonic crystal templates. Proc. SPIE 2007, 6480, 64800Q.
126. Lin, Y.; Harb, A.; Rodriguez, D.; Lozano, K.; Xu, D.; Chen, K.P. Holographic fabrication of photonic crystals using multidimensional phase masks. J. Appl. Phys. 2008, 104, 113111.
127. Zhou, G.; Chau, F.S. Three-dimensional photonic crystal by holographic contact lithography using a single diffraction mask. Appl. Phys. Lett. 2007, 90, 181106-181101.
128. Di, X.; Chen, K.P.; Ohlinger, K.; Lin, Y. Holographic fabrication of diamondlike photonic crystal template using two-dimensional diffractive optical elements. Appl. Phys. Lett. 2008, 93, 031101.
129. George, M.C.; Nelson, E.C.; Rogers, J.A.; Braun, P.V. Direct fabrication of 3D periodic inorganic microstructures using conformal phase masks. Angew. Chem. Int. Edit. 2008, 48, 144-148.
130. Chanda, D.; Zachari, N.; Haque, M.; Ng, M.L.; Herman, P.R. Flexible fabrication of three-dimensional optical-domain photonic crystals using a combination of single-laser-exposure diffractive-optics lithography and template inversion. Opt. Lett. 2009, 34, 3920-3922.
131. Brueck, S.R.J. Optical and interferometric lithography-Nanotechnology enablers. Proc. IEEE 2005, 93, 1704-1721.
132. Horner, J.L. Additional property of interferometer symmetry. Appl. Opt. 1978, 17, 505-505.
133. Lai, N.D.; Liang, W.P.; Lin, J.H.; Hsu, C.C.; Lin, C.H. Fabrication of two-and three-dimensional periodic structures by multi-exposure of two-beam interference technique. Opt. Express 2005, 13, 9605-9611.
134. Divliansky, I.; Mayer, T.S. Three-dimensional low-index-contrast photonic crystals fabricated using a tunable beam splitter. Nanotechnol. 2006, 17, 1241.
135. Xu, J.; Ma, R.; Wang, X.; Tam, W.Y. Icosahedral quasicrystals for visible wavelengths by optical interference holography. Opt. Express 2007, 15, 4287-4295..
136. Wu, L.; Zhong, Y.; Chan, C.T.; Wong, K.S.; Wang, G.P. Fabrication of large area two-and three-dimensional polymer photonic crystals using single refracting prism holographic lithography. Appl. Phys. Lett. 2005, 86, 241102.
137. Dakss, M.L.; Kuhn, L.; Heidrich, P.F.; Scott, B.A. Grating coupler for efficient excitation of optical guided waves in thin films. Appl. Phys. Lett. 1970, 16, 523-525.
138. Zaidi, S.H.; Brueck, S.R.J. Multiple-exposure interferometric lithography. J. Vac. Sci. Technol. B 1993, 11, 658-666.
139. Lim, K.-S.; Lee, M.; Shin, H.; Kim, H. Step-wise Ag thin film patterns fabricated by holographic lithography. Thin Solid Films 2009, 517, 3273-3275.
140. Kondo, T.; Juodkazis, S.; Misawa, H. Reduction of capillary force for high-aspect ratio nanofabrication. Appl. Phys. A 2005, A81, 1583-1586.
141. Amako, J.; Sawaki, D.; Kato, M. Fringe-shifting interferometric laser lithography with optical nonlinearity for micro-and nanofabrications. Appl. Phys. Lett. 2007, 91, 054105.
142. Lasagni, A.; Dajun, Y.; Peng, S.; Das, S. Rapid fabrication of biocompatible hydrogels microdevices using laser interference lithography. Proc. SPIE 2009, 7365, 73650I.
143. Zhong, Y.; Zhou, J.; Wong, K.S. Two-photon fabrication of photonic crystals by single-beam laser holographic lithography. J. Appl. Phys. 2010, 107, 074311.
144. Yang, Y.; Wang, G.P. Realization of periodic and quasiperiodic microstructures with sub-diffraction-limit feature sizes by far-field holographic lithography. Appl. Phys. Lett. 2006, 89, 111104-111101.
145. Zhu, T.-F.; Tan, B.-H.; Pan, X.-F.; Tao, W.-D. Fabrication of two-and three-dimensional periodic submicron structures by holographic lithography with a 635nm laser and matched photopolymer. Chin. Phys. B 2010, 19, 014218.
146. Arsh, A.; Klebanov, M.; Lyubin, V.; Shapiro, L.; Feigel, A.; Veinger, M.; Sfez, B. Glassy mAs2S3nAs2Se3 photoresist films for interference laser lithography. Opt. Mater. 2004, 26, 301-304.
147. Wang, X.; Su, H.; Zhang, L.; He, Y.; Zheng, X.; Wang, H. Fabrication of a submicrometer crystalline structure by thermoplastic holography. Appl. Opt. 2001, 40, 5588-5591.
148. Yang, S.; Megens, M.; Aizenberg, J.; Wiltzius, P.; Chaikin, P.M.; Russel, W.B. Creating periodic three-dimensional structures by multibeam interference of visible laser. Chem. Mater. 2002, 14, 2831-2833.
149. Aydin, C.; Zaslavsky, A.; Sonek, G.J.; Goldstein, J. Reduction of reflection losses in ZnGeP2 using motheye antireflection surface relief structures. Appl. Phys. Lett. 2002, 80, 2242-2244.
150. Liu, T.; Fallahi, M.; Moloney, J.V.; Mansuripur, M. Fabrication of two-dimensional photonic crystals with embedded defects using blue-laser-writer and optical holography. IEEE Phot. Tech. L. 2006, 18, 1100-1102.
151. Berendsen, C.W.J.; Skeren, M.; Najdek, D.; Cerny, F. Superhydrophobic surface structures in thermoplastic polymers by interference lithography and thermal imprinting. Appl. Surf. Sci. 2009, 255, 9305-9310.
152. Fucetola, C.P.; Korre, H.; Berggren, K.K. Low-cost interference lithography. J. Vac. Sci. Technol. B 2009, 27, 2958-2961.
153. Jang, J.-H.; Dendukuri, D.; Alan, H.T.; Thomas, E.L.; Doyle, P.S. A route to three-dimensional structures in a microfluidic device: Stop-flow interference lithography. Angew. Chem. Int. Edit. 2007, 46, 9027-9031.
154. Suleski, T.J.; Baggett, B.; Delaney, W.F.; Koehler, C.; Johnson, E.G. Fabrication of high-spatial-frequency gratings through computer-generated near-field holography. Opt. Lett. 1999, 24, 602-604.
155. de Ridder, R.M.; Bostan, C.G.; van Wolferen, H.A.G.M.; van Dorssen, I.; Vogelaar, L.; Segerink, F.B.; Kuipers, L.; van Hulst, N.F. Fabrication of photonic crystal slabs and defects using laser interference lithography and focused ion beam-assisted deposition. In Proceedings of the 4th International Conference on Transparent Optical Networks, Warsaw, Poland, 21-25 April 2002; pp. 14-19
156. Chen, X.; Zaidi, S.H.; Brueck, S.R.J.; Devine, D.J. Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications. J. Vac. Sci. Technol. B 1996, 14, 3339-3349.
157. Campbell, M.; Sharp, D.N.; Harrison, M.T.; Denning, R.G.; Turberfield, A.J. Fabrication of photonic crystals for the visible spectrum by holographic lithography. Nature 2000, 404, 53-56.
158. Berger, V.; Gauthier-Lafaye, O.; Costard, E. Fabrication of a 2D photonic bandgap by a holographic method. Electron. Lett. 1997, 33, 425-426.
159. Lai, N.D.; Liang, W.P.; Lin, J.H.; Hsu, C.C. Rapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques. Opt. Express 2005, 13, 5331-5337.
160. Peng, C.S.; Tan, C. Fast, high efficiency and cost-effective laser nano-lithography. In Proceedings of 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro-and Nano-Optical Devices and Systems, Dalian, China, 26-29 April 2010; pp. 765708-765712.
161. Lemme, M.C.; Moormann, C.; Lerch, H.; Moller, M.; Vratzov, B.; Kurz, H. Triple-gate metal-oxide-semiconductor field effect transistors fabricated with interference lithography. Nanotechnology 2004, 15, 208-210.
162. Ura, S.; Hamada, M.; Ohmori, J.; Nishio, K.; Kintaka, K. Free-space-wave drop demultiplexing waveguide device fabricated by use of the interference exposure method. Appl. Opt. 2006, 45, 22-26.
163. Fritze, M.; Bloomstein, T.M.; Tyrrell, B.; Fedynyshyn, T.H.; Efremow, N.N., Jr,; Hardy, D.E.; Cann, S.; Lennon, D.; Spector, S.; Rothschild, M.; Brooker, P. Hybrid optical maskless lithography: scaling beyond the 45nm node. J. Vac. Sci. Technol. B 2005, 23, 2743-2748.
164. Capeluto, M.G.; Vaschenko, G.; Grisham, M.; Marconi, M.C.; Luduena, S.; Pietrasanta, L.; Yunfeng, L.; Parkinson, B.; Menoni, C.S.; Rocca, J.J. Nanopatterning with interferometric lithography using a compact lambda = 46.9-nm laser. IEEE Nanotechnol. 2006, 5, 3-7.
165. Ritucci, A.; Reale, A.; Zuppella, P.; Reale, L.; Tucceri, P.; Tomassetti, G.; Bettotti, P.; Pavesi, L. Interference lithography by a soft X-ray laser beam: nanopatterning on photoresists. J. Appl. Phys. 2007, 102, 034313.
166. Solak, H.H.; He, D.; Li, W.; Singh-Gasson, S.; Cerrina, F.; Sohn, B.H.; Yang, X.M.; Nealey, P. Exposure of 38nm period grating patterns with extreme ultraviolet interferometric lithography. Appl. Phys. Lett. 1999, 75, 2328-2330.
167. Isoyan, A.; Cheng, Y.C.; Jiang, F.; Wallace, J.; Cerrina, F.; Bollepalli, S. Progress in extreme ultraviolet interferometric and holographic lithography. J. Vac. Sci. Technol. B 2007, 25, 2145-2150.
168. Gates, B.D.; Xu, Q.; Stewart, M.; Ryan, D.; Willson, C.G.; Whitesides, G.M. New Approaches to nanofabrication: molding, printing, and other techniques. Chem. Rev. 2005, 105, 1171-1196.
169. Sreekanth, K.V.; Chua, J.K.; Murukeshan, V.M. Interferometric lithography for nanoscale feature patterning: A comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference. Appl. Opt. 2010, 49, 6710-6717.
170. Luttge, R. Massively parallel fabrication of repetitive nanostructures: nanolithography for nanoarrays. J. Phys. D Appl. Phys. 2009, 42, 123001.
171. Smith, H.I. Low cost nanolithography with nanoaccuracy. In Proceedings of Rutherford Memorial Workshop on Semiconductor Nanostructures, Enschede, The Netherlands, 5-9 February 2001; pp. 104-109.
172. Greenway, R.T.; Hendel, R.; Jeong, K.; Kahng, A.B.; Petersen, J.S.; Rao, Z.; Smayling, M.C. Interference assisted lithography for patterning of 1D gridded design. Proc. SPIE 2009, 7271, 72712U.
173. Lin, Y.K.; Harb, A.; Lozano, K.; Xu, D.; Chen, K.P. Five beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element. Opt. Express 2009, 17, 16625-16631.
174. Murakowski, J.; Schneider, G.J.; Prather, D. Fabrication of 3-dimensional Photonic Crystals with Embedded Defects. In Micromachining Technology for Micro-Optics and Nano-Optics II, San Jose, CA, USA, 27-29 January 2004; pp. 181-189.
175. Zhao, L.; Xuan, Y.; Qi, M. Generating integrated-circuit patterns via cutting and stitching of gratings. J. Vac. Sci. Technol. B 2009, 27, 2750-2754.
176. Szymanski, D.; Dylewicz, R.; Patela, S.; Bartkiewicz, S.; Miniewicz, A. Defects generation in photonic crystal pattern by electron beam induced deposition technique. Proc. SPIE 2005, 5950, 59501T.
177. van Rijn, C.J.M. Laser interference as a lithographic nanopatterning tool. J. Microlith. Microfab. Microsys. 2006, 5, 11012-11011.
178. Sun, H.-B.; Nakamura, A.; Kaneko, K.; Shoji, S.; Kawata, S. Direct laser writing defects in holographic lithography-created photonic lattices. Opt. Lett. 2005, 30, 881-883.
179. Braun, P.V.; Rinne, S.A.; Garcia-Santamaria, F. Introducing defects in 3D photonic crystals: State of the art. Adv. Mater. 2006, 18, 2665-2678.
180. Parisse, P.; Luciani, D.; D'Angelo, A.; Santucci, S.; Zuppella, P.; Tucceri, P.; Reale, A.; Ottaviano, L. Patterning at the nanoscale: Atomic force microscopy and extreme ultraviolet interference lithography. Mater. Sci. Eng. B 2009, 165, 227-230.
181. Ramanan, V.; Nelson, E.; Brzezinski, A.; Braun, P.V.; Wiltzius, P. Three dimensional silicon-air photonic crystals with controlled defects using interference lithography. Appl. Phys. Lett. 2008, 92, 173304.
182. Lai, N.D.; Lin, J.H.; Liang, W.P.; Hsu, C.C.; Lin, C.H. Precisely introducing defects into periodic structures by using a double-step laser scanning technique. Appl. Opt. 2006, 45, 5777-5782.
183. Scrimgeour, J.; Sharp, D.N.; Blanford, C.F.; Roche, O.M.; Denning, R.G.; Turberfield, A.J. Three-dimensional optical lithography for photonic microstructures. Adv. Mater. 2006, 18, 1557-1560.
184. Rumpf, R.C.; Johnson, E.G. Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography. J. Opt. Soc. Am. A 2004, 21, 1703-1713.
185. Liu, C.H.; Hong, M.H.; Lum, M.C.; Flotow, H.; Ghadessy, F.; Zhang, J.B. Large-area micro/nanostructures fabrication in quartz by laser interference lithography and dry etching. Appl. Phys. A 2010, 101, 237-241.
186. Salaun, M.; Audier, M.; Delyon, F.; Duneau, M. 3-D holographic lithography of organic-inorganic hybrids. Appl. Surf. Sci. 2007, 254, 830-835.
187. Saravanamuttu, K.; Blanford, C.F.; Sharp, D.N.; Dedman, E.R.; Turberfield, A.J.; Denning, R.G. Sol-gel organic-inorganic composites for 3-D holographic lithography of photonic crystals with submicron periodicity. Chem. Mater. 2003, 15, 2301-2304.
188. Gronheid, R.; Leeson, M.J. Extreme ultraviolet interference lithography as applied to photoresist studies. J. Microlith. Microfab. Microsys. 2009, 8, 021205.
189. Liu, Y.J.; Sun, X.W. Electrically tunable two-dimensional holographic photonic crystal fabricated by a single diffractive element. Appl. Phys. Lett. 2006, 89, 171101.
190. Teteris, J. Immersion holography based on amorphous chalcogenide films. J. Mater. Sci. Mater. Electron. 2009, 20, 149-152.
191. Shishido, A.; Diviliansky, I.B.; Khoo, I.C.; Mayer, T.S.; Nishimura, S.; Egan, G.L.; Mallouk, T.E. Direct fabrication of two-dimensional titania arrays using interference photolithography. Appl. Phys. Lett. 2001, 79, 3332-3334.
192. Guo, Z.G.; Qu, S.L.; Han, Y.H.; Liu, S.T. Multi-photon fabrication of two-dimensional periodic structure by three interfered femtosecond laser pulses on the surface of the silica glass. Opt. Commun. 2007, 280, 23-26.
193. Vlcek, M.; Schroeter, S.; Brueckner, S.; Fehling, S.; Fiserova, A. Direct fabrication of surface relief gratings in chalcogenide glasses by excimer laser interference lithography. J. Mater. Sci. Mater. Electron. 2009, 20, 290-293.
194. Duarte, M.; Lasagni, A.; Giovanelli, R.; Narciso, J.; Louis, E.; Mucklich, F. Increasing lubricant film lifetime by grooving periodical patterns using laser interference metallurgy. Adv. Eng. Mater. 2008, 10, 554-558.
195. Lasagni, A.; Peng, S.; Hendricks, J.L.; Shaw, C.M.; Martin, D.C.; Das, S. Direct fabrication of periodic patterns with hierarchical sub-wavelength structures on poly(3,4-ethylene dioxythiophene)poly(styrene sulfonate) thin films using femtosecond laser interference patterning. Appl. Surf. Sci. 2010, 256, 1708-1713.
196. Everitt, H.O. Applications of photonic band gap structures. Opt. Photon. News 1992, 3, 20-23.
197. Parker, G.; Charlton, M. Photonic crystals. Phys. World 2000, 13, 29-34.
198. Chen, J.Q.; Jiang, W.; Chen, X.N.; Wang, L.; Zhang, S.S.; Chen, R.T. Holographic three-dimensional polymeric photonic crystals operating in the 1550nm window. Appl. Phys. Lett. 2007, 90, 093102.
199. Zhong, Y.C.; Zhu, S.A.; Su, H.M.; Wang, H.Z.; Chen, J.M.; Zeng, Z.H.; Chen, Y.L. Photonic crystal with diamondlike structure fabricated by holographic lithography. Appl. Phys. Lett. 2005, 87, 61103-61101.
200. Yang, X.L.; Cai, L.Z.; Liu, Q.; Liu, H.K. Theoretical bandgap modeling of two-dimensional square photonic crystals fabricated by the interference of three noncoplanar laser beams. J. Opt. Soc. Am. B 2004, 21, 1699-1702.
201. Yang, X.L.; Cai, L.Z.; Wang, Y.R. Larger bandgaps of two-dimensional triangular photonic crystals fabricated by holographic lithography can be realized by recording geometry design. Opt. Express 2004, 12, 5850-5856.
202. Xia, D.Y.; Zhang, J.Y.; He, X.; Brueck, S.R.J. Fabrication of three-dimensional photonic crystal structures by interferometric lithography and nanoparticle self-assembly. Appl. Phys. Lett. 2008, 93, 071105.
203. Moon, J.H.; Small, A.; Yi, G.-R.; Lee, S.-K.; Chang, W.-S.; Pine, D.J.; Yang, S.-M. Patterned polymer photonic crystals using soft lithography and holographic lithography. Synth. Met. 2005, 148, 99-102.
204. Chan, T.Y.M.; John, S. Circuits for light in holographically defined photonic-band-gap materials. Phys. Rev. A 2008, 78, 033812.
205. Cho, C.O.; Jeong, J.; Lee, J.; Jeon, H.; Kim, I.; Jang, D.H.; Park, Y.S.; Woo, J.C. Photonic crystal band edge laser array with a holographically generated square-lattice pattern. Appl. Phys. Lett. 2005, 87, 161102.
206. Gauthier, R.C.; Mnaymneh, K. Towards physical implementation of an optical add-drop multiplexer (OADM) based upon properties of 12-fold photonic quasicrystals. Proc. SPIE 2005, 5970, 59700.
207. Geyer, U.; Hauss, J.; Riedel, B.; Gleiss, S.; Lemmer, U.; Gerken, M. Large-scale patterning of indium tin oxide electrodes for guided mode extraction from organic light-emitting diodes. J. Appl. Phys. 2008, 104, 093111.
208. Liang, G.Q.; Mao, W.D.; Pu, Y.Y.; Zou, H.; Wang, H.Z.; Zeng, Z.H. Fabrication of two-dimensional coupled photonic crystal resonator arrays by holographic lithography. Appl. Phys. Lett. 2006, 89, 41902.
209. Lu, Q.-Y.; Zhang, W.; Wang, L.-J.; Liu, J.-Q.; Li, L.; Liu, F.-Q.; Wang, Z.-G. Holographic fabricated photonic-crystal distributed-feedback quantum cascade laser with near-diffractionlimited beam quality. Opt. Express 2009, 17, 18900-18905.
210. Klein, M.W.; Enkrich, C.; Wegener, M.; Linden, S. Second-harmonic generation from magnetic metamaterials. Science 2006, 313, 502-504.
211. Pendry, J.B.; Holden, A.J.; Robbins, D.J.; Stewart, W.J. Magnetism from conductors and enhanced nonlinear phenomena. IEEE T. Microw. Theory 1999, 47, 2075-2084.
212. Pendry, J.B.; Smith, D.R. The quest for the superlens. Sci. Amer. 2006, 295, 60-67.
213. Schurig, D.; Mock, J.J.; Justice, B.J.; Cummer, S.A.; Pendry, J.B.; Starr, A.F.; Smith, D.R. Metamaterial electromagnetic cloak at microwave frequencies. Science 2006, 314, 977-980.
214. Veselago, V.G. The electrodynamics of substances simultaneously negative values of ε and μ. Sov. Phys. Usp. 1968, 10, 509-514.
215. Caloz, C.; Itoh, T. Metamaterials for high-frequency electronics. Proc. IEEE 2005, 93, 1744-1751.
216. Grzegorczyk, T.M.; Moss, C.D.; Lu, J.; Chen, X.; Pacheco, J., Jr,; Kong, J.A. Properties of left-handed metamaterials: Transmission, backward phase, negative refraction, and focusing. IEEE Trans. Microw. Theory 2005, 53, 2956-2966.
217. Hardy, W.N.; Whitehead, L.A. Split-ring resonator for use in magnetic resonance from 200-2000MHz. Rev. Sci. Instrum. 1981, 52, 213-216.
218. Dolling, G.; Enkrich, C.; Wegener, M.; Soukoulis, C.M.; Linden, S. Simultaneous negative phase and group velocity of light in a metamaterial. Science 2006, 312, 892-894.
219. Linden, S.; Enkrich, C.; Dolling, G.; Klein, M.W.; Zhou, J.; Koschny, T.; Soukoulis, C.M.; Burger, S.; Schmidt, F.; Wegener, M. Photonic metamaterials: Magnetism at optical frequencies. IEEE J. Sel. Top. Quantum Electron. 2006, 12, 1097-1105.
220. Zheludev, N.I. The road ahead for metamaterials. Science 2010, 328, 582-583.
221. Liang, G.Q.; Mao, W.D.; Zou, H.; Chen, B.C.; Cao, J.F.; Pu, Y.Y.; Wen, X.W.; Wang, H.Z. Holographic formation of large area split-ring arrays for magnetic metamaterials. J. Mod. Opt. 2008, 55, 1463-1472.
222. Feth, N.; Enkrich, C.; Wegener, M.; Linden, S. Large-area magnetic metamaterials via compact interference lithography. Opt. Express 2007, 15, 501-507.
223. Li, Q.; Wang, G.P. Tunable photonic metamaterials in the near infrared frequencies. Opt. Express 2010, 18, 14123-14128.
224. Yang, Y.; Li, Q.Z.; Wang, G.P. Design and fabrication of diverse metamaterial structures by holographic lithography. Opt. Express 2008, 16, 11275-11280.
225. Tamma, V.A.; Lee, J.-H.; Wu, Q.; Park, W. Visible frequency magnetic activity in silver nanocluster metamaterial. Appl. Opt. 2010, 49, A11-A17.
226. Kikuta, H.; Toyota, H.; Yu, W. Optical elements with subwavelength structured surfaces. Opt. Rev. 2003, 10, 63-73.
227. Gaylord, T.K.; Baird, W.E.; Moharam, M.G. Zero-reflectivity high spatial-frequency rectangular-groove dielectric surface-relief gratings. Appl. Opt. 1986, 25, 4562-4567.
228. Sawaki, D.; Amako, J. Deep-UV laser-based nano-patterning with holographic techniques. Proc. SPIE 2007, 6459, 64590F.
229. Amako, J.; Sawaki, D.; Fujii, E. High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference lithography. Appl. Opt. 2009, 48, 5105-5113.
230. Yu, J.S.; Song, Y.M.; Leem, J.W.; Lee, Y.T. Subwavelength antireflection structures and their device applications. Proc. SPIE 2010, 7608, 760812.
231. Chen, Y.-P.; Chiu, H.-C.; Chen, G.-Y.; Chiang, C.-H.; Tseng, C.-T.; Lee, C.-H.; Wang, L.A. Fabrication and measurement of large-area sub-wavelength structures with broadband and wide-angle antireflection effect. Microelectron. Eng. 2010, 87, 1323-1327.
232. Gaylord, T.K.; Glytsis, E.N.; Moharam, M.G. Zero-reflectivity homogeneous layers and high spatial-frequency surface-relief gratings on lossy materials. Appl. Opt. 1987, 26, 3123-3135.
233. Hartman, N.F.; Gaylord, T.K. Antireflection gold surface-relief gratings: Experimental characteristics. Appl. Opt. 1988, 27, 3738-3743.
234. Clapham, P.B.; Hutley, M.C. Reduction of lens reflection by the 'moth eye' principle. Nature 1973, 244, 281-282.
235. MacLeod, B.; Sonek, G. Motheye surfaces reflect little light. Laser Focus World 1999, 35, 109-114.
236. Nakano, H.; Morita, H.; Washida, H.; Kato, T.; Hayashi, S.; Onoe, A. Low cost and high performance antireflective coatings for solar cells. Opt. Engr. 1985, 24, 207-212.
237. Sopori, B.L.; Pryor, R.A. Design of antireflection coatings for textured silicon solar cells. Solar Cells 1983, 8, 249-261.
238. Song, Y.M.; Yu, J.S.; Lee, Y.T. Antireflective submicrometer gratings on thin-film silicon solar cells for light-absorption enhancement. Opt. Lett. 2010, 35, 276-278.
239. Zhuang, L.; Schablitsky, S.; Shi, R.C.; Chou, S.Y. Fabrication and performance of thin amorpnous Si subwavelength transmission grating for controlling vertical cavity surface emitting laser polarization. J. Vac. Sci. Technol. B 1996, 14, 4055-4057.
240. Minseung, A.; Heilmann, R.K.; Schattenburg, M.L. Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers. J. Vac. Sci. Technol. B 2007, 25, 2593-2597.
241. Brundrett, D.L.; Glytsis, E.N.; Gaylord, T.K. Subwavelength transmission grating retarders for use at 10.6um. Appl. Opt. 1996, 35, 6195-6202.
242. Magnusson, R.; Wang, S.S. New principle for optical filters. Appl. Phys. Lett. 1992, 61, 1022-1024.
243. Magnusson, R.; Wang, S.S. Transmission bandpass guided-mode resonance filters. Appl. Opt. 1995, 34, 8106-8109.
244. Tibuleac, S.; Magnusson, R. Reflection and transmission guided-mode resonance filters. J. Opt. Soc. Am. A 1997, 14, 1617-1626.
245. Shokooh-Saremi, M.; Magnusson, R. Leaky-mode resonant reflectors with extreme bandwidths. Opt. Lett. 2010, 35, 1121-1123.
246. Colgan, M.J.; Brett, M.J. Field emission from carbon and silicon films with pillar microstructure. Thin Solid Films 2001, 389, 1-4.
247. Xu, N.S.; Huq, S.E. Novel cold cathode materials and applications. Mater. Sci. Eng. R 2005, 48, 47-189.
248. Spallas, J.P.; Hawryluk, A.M.; Kania, D.R. Field emitter array mask patterning using laser interference lithography. J. Vac. Sci. Technol. B 1995, 13, 1973-1978.
249. Dawood, M.K.; Liew, T.H.; Lianto, P.; Hong, M.H.; Tripathy, S.; Thong, J.T.L.; Choi, W.K. Interference lithographically defined and catalytically etched, large-area silicon nanocones from nanowires. Nanotechnology 2010, 21, 205305.
250. Yun, J.; Wang, R.; Choi, W.K.; Thong, J.T.L.; Thompson, C.V.; Mei, Z.; Foo, Y.L.; Hong, M.H. Field emission from a large area of vertically-aligned carbon nanofibers with nanoscale tips and controlled spatial geometry. Carbon 2010, 48, 1362-1368.
251. Li, H.; Luo, X.; Du, C.; Chen, X.; Fu, Y. Ag dots array fabricated using laser interference technique for biosensing. Sens. Actuat. B 2008, 134, 940-944.
252. Sahoo, P.K.; Vogelsang, K.; Schift, H.; Solak, H.H. Surface plasmon resonance in near-field coupled gold cylinder arrays fabricated by EUV-interference lithography and hot embossing. Appl. Surf. Sci. 2009, 256, 431-434.
253. Liu, C.H.; Hong, M.H.; Cheung, H.W.; Zhang, F.; Huang, Z.Q.; Tan, L..; Hor, T.S.A. Bimetallic structure fabricated by laser interference lithography for tuning surface plasmon resonance. Opt. Express 2008, 16, 10701-10709.
254. Menezes, J.W.; Braga, E.S.; Cescato, L. Photonic crystals and plasmonic structures recorded by multi-exposure of holographic patterns. Proc. SPIE 2009, 7358, 73580K.
255. Daniel, C. Biomimetic structures for mechanical applications by interfering laser beams: more than solely holographic gratings. J. Mater. Res. 2006, 21, 2098-2105.
256. Wu, D.; Chen, Q.-D.; Yao, J.; Guan, Y.-C.; Wang, J.-N.; Niu, L.-G.; Fang, H.-H.; Sun, H.-B. A simple strategy to realize biomimetic surfaces with controlled anisotropic wetting. Appl. Phys. Lett. 2010, 96, 053704.
257. Yang, Y.-L.; Hsu, C.-C.; Chang, T.-L.; Kuo, L.-S.; Chen, P.-H. Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography. Appl. Surf. Sci. 2010, 256, 3683-3687.
258. Zhang, Z.; Wang, X.; Liu, Y.; Guo, Y.; Hong, Y.; Xu, X.; Fu, S.; Xu, P.; Wang, J.; Cai, J. Fabrication of CoFe nanostructures by holographic lithography. Proc. SPIE 2008, 6831, 68311B.
259. Murillo, R.; van Wolferen, H.A.; Abelmann, L.; Lodder, J. C. Fabrication of patterned magnetic nanodots by laser interference lithography. Microelectron. Eng. 2005, 78-79, 260-265.
260. Rosa, W.O.; Knobel, M.; Cescato, L.; Gobbi, A.L.; Vazquez, M. Experimental magnetic study and evidence of the exchange bias effect in unidimensional Co arrays produced by interference lithography. Solid State Commun. 2007, 142, 228-231.
261. Leufke, P.M.; Riedel, S.; Lee, M.-S.; Li, J.; Rohrmann, H.; Eimuller, T.; Leiderer, P.; Boneberg, J.; Schatz, G.; Albrecht, M. Two different coercivity lattices in Co/Pd multilayers generated by single-pulse direct laser interference lithography. J. Appl. Phys. 2009, 105, 113915.
262. Sinclair, G.; Jordan, P.; Courtial, J.; Padgett, M.; Cooper, J.; Laczik, Z.J. Assembly of 3-dimensional structures using programmable holographic optical tweezers. Opt. Express 2004, 12, 5475-5480.
263. Leach, J.; Sinclair, G.; Jordan, P.; Courtial, J.; Padgett, M.J.; Cooper, J.; Laczik, Z.J. 3D manipulation of particles into crystal structures using holographic optical tweezers. Opt. Express 2004, 12, 220-226.
264. Horner, F.; Woerdemann, M.; Muller, S.; Maier, B.; Denz, C. Full 3D translational and rotational optical control of multiple rod-shaped bacteria. J. Biophotonics 2010, 3, 468-475.
265. Woerdemann, M.; Glasener, S.; Horner, F.; Devaux, A.; De Cola, L.D.; Denz, C. Dynamic and reversible organization of zeolite L crystals induced by holographic optical tweezers. Adv. Mater. 2010, 22, 4176-4179.
266. Chiou, A.E.; Wang, W.; Sonek, G.J.; Hong, J.; Berns, M.W. Interferometric optical tweezers. Opt. Commun. 1997, 133, 7-10.
267. MacDonald, M.P.; Volke-Sepulveda, K.; Paterson, L.; Arlt, J.; Sibbett, W.; Dholakia, K. Revolving interference patterns for the rotation of optically trapped particles. Opt. Commun. 2002, 201, 21-28.
268. MacDonald, M.P.; Paterson, L.; Volke-Sepulveda, K.; Arlt, J.; Sibbett, W.; Dholakia, K. Creation and manipulation of three-dimensional optically trapped structures. Science 2002, 296, 1101-1103.
269. Casaburi, A.; Pesce, G.; Zemánek, P.; Sasso, A. Two-and three-beam interferometric optical tweezers. Opt. Commun. 2005, 251, 393-404.
270. Jonas, A.; Zemanek, P. Light at work: The use of optical forces for particle manipulation, sorting, and analysis. Electrophoresis 2008, 29, 4813-4851.
271. MacDonald, M.P.; Paterson, L.; Sibbett, W.; Dholakia, K.; Bryant, P.E. Trapping and manipulation of low-index particles in a two-dimensional interferometric optical trap. Opt. Lett. 2001, 26, 863-865.
272. Schonbrun, E.; Piestun, R.; Jordan, P.; Cooper, J.; Wulff, K.D.; Courtial, J.; Padgett, M. 3D interferometric optical tweezers using a single spatial light modulator. Opt. Express 2005, 13, 3777-3786.
273. Jakl, P.; Cizmar, T.; Sery, M.; Zemanek, P. Static optical sorting in a laser interference field. Appl. Phys. Lett. 2008, 92, 161110-161113.
274. Wieringa, P.A.; Wiertz, R.W.F.; de Weerd, E.L.; Rutten, W.L.C. In vitro verification of a 3-D regenerative neural interface design: Examination of neurite growth and electrical properties within a bifurcating microchannel structure. Proc. IEEE 2010, 98, 389-397.
275. Lutolf, M.P.; Weber, F.E.; Schmoekel, H.G.; Schense, J.C.; Kohler, T.; Muller, R.; Hibbell, J.A. Repair of bone defects using synthetic mimetics of collagenous extracellular matrices. Nature Biotechnol. 2003, 21, 513-518.
276. Capadona, J.R.; Petrie, T.A.; Fears, K.P.; Latour, R.A.; Collard, D.M.; Garcia, A.J. Surface-nucleated assembly of fibrillar extracellular matrices. Adv. Mater. 2005, 17, 2604-2608.
277. Gallant, N.D.; Capadona, J.R.; Frazier, A.B.; Collard, D.M.; Garcia, A.J. Micropatterned surfaces to engineer focal adhesions for analysis of cell adhesion stregthening. Langmuir 2002, 18, 5579-5584.
278. Koch, W.H. Technology platforms for pharmacogenomic diagnostic assays. Nat. Rev. Drug Discov. 2004, 3, 749-761.
279. Sniadecki, N.J.; Desai, R.A.; Ruiz, S.A.; Chen, C.S. Nanotechnology for cell-substrate interactions. Ann. Biomed. Eng. 2006, 34, 59-74.
280. Zhao, G.; Zinger, O.; Schwartz, Z.; Wieland, M.; Landolt, D.; Boyan, B.D. Osteoblast-like cells are sensitive to submicron-scale surface structure. Clin. Oral Implan. Res. 2006, 17, 258-264.
281. Zoller, F.A.; Padeste, C.; Ekinci, Y.; Solak, H.H.; Engel, A. Nanostructured substrates for high density protein arrays. Microelectron. Eng. 2008, 85, 1370-1374.
282. Hedberg-Dirk, E.L.; Martinez, U.A. Large-scale protein arrays generated with interferometric lithography for spatial control of cell-material interactions. J. Nanomater. 2010, 176750.
283. Akhavan, O.; Abdolahad, M.; Asadi, R. Storage of Ag nanoparticles in pore-arrays of SU-8 matrix for antibacterial applications. J. Phys. D Appl. Phys. 2009, 42.