Interference lithography by a soft x-ray laser beam: Nanopatterning on photoresists

Journal of Applied Physics

Volumn 102, Issue 3, 2007, Pages

  Ritucci, A ^a   Reale, A ^a   Zuppella, P ^a   Reale, L ^a   Tucceri, P ^a   Tomassetti, G ^a   Bettotti, P ^b   Pavesi, L ^b  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETERS; LASER BEAM EFFECTS; PERIODIC STRUCTURES; PHOTORESISTS; POLYMETHYL METHACRYLATES;

GRATING STRUCTURES; HIGH-RESOLUTION LASER INTERFERENCE LITHOGRAPHY;

NANOLITHOGRAPHY;

LITHOGRAPHY;

EID: 34548040217     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2764244     Document Type: Article

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