-
1
-
-
0000495542
-
Arrays of gated field-emitter cones having 0.32 pm tip-to-tip spacing
-
C. O. Bozler, C. T. Harris, S. Rabe, D. D. Rathman, M. A. Hollis, and H. I. Smith, “Arrays of gated field-emitter cones having 0.32 pm tip-to-tip spacing, ” J. Vac. Sci. Technol. B 12, 629-632 (1994).
-
(1994)
J. Vac. Sci. Technol
, vol.B 12
, pp. 629-632
-
-
Bozler, C.O.1
Harris, C.T.2
Rabe, S.3
Rathman, D.D.4
Hollis, M.A.5
Smith, H.I.6
-
2
-
-
0029368294
-
Field emitter array mask patterning using interference lithography
-
J. P. Spallas, A. M. Hawryluk, and D. R. Kania, “Field emitter array mask patterning using interference lithography, ” J. Vac. Sci. Technol. B 13, 1973-1978 (1995).
-
(1995)
J. Vac. Sci. Technol
, vol.B 13
, pp. 1973-1978
-
-
Spallas, J.P.1
Hawryluk, A.M.2
Kania, D.R.3
-
3
-
-
0000944804
-
Inter-ferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications
-
X. Chen, S. H. Zaidi, S. R. J. Brueck, and D. J. Devine, “Inter-ferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications, ” J. Vac. Sci. Technol. B 14, 3339-3349 (1996).
-
(1996)
J. Vac. Sci. Technol
, vol.B 14
, pp. 3339-3349
-
-
Chen, X.1
Zaidi, S.H.2
Brueck, S.R.J.3
Devine, D.J.4
-
4
-
-
0031142346
-
The use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays
-
A. Fernandez, H. T. Nguyen, J. A. Britten, R. D. Boyd, D. R. Kania, A. M. Hawryluk, and M. D. Perry, “The use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays, ” J. Vac. Sci. Technol. B 15, 729-735 (1997).
-
(1997)
J. Vac. Sci. Technol
, vol.B 15
, pp. 729-735
-
-
Fernandez, A.1
Nguyen, H.T.2
Britten, J.A.3
Boyd, R.D.4
Kania, D.R.5
Hawryluk, A.M.6
Perry, M.D.7
-
5
-
-
0000804952
-
Multiple-exposure interfero-metric lithography
-
S. H. Zaidi and S. R. J. Brueck, “Multiple-exposure interfero-metric lithography, ” J. Vac. Sci. Technol. B 11, 658-666 (1993).
-
(1993)
J. Vac. Sci. Technol
, vol.B 11
, pp. 658-666
-
-
Zaidi, S.H.1
Brueck, S.R.J.2
-
6
-
-
0030247518
-
Magnetic force microscopy of single-domain cobalt dots patterned using interference lithography
-
A. Fernandez, P. J. Bedrossian, S. L. Baker, S. P. Vernon, and D. R. Kania, “Magnetic force microscopy of single-domain cobalt dots patterned using interference lithography, ” IEEE Trans. Magn. 32, 4472-4474 (1996).
-
(1996)
IEEE Trans. Magn.
, vol.32
, pp. 4472-4474
-
-
Fernandez, A.1
Bedrossian, P.J.2
Baker, S.L.3
Vernon, S.P.4
Kania, D.R.5
-
7
-
-
0001741379
-
Methods for fabricating array of holes using interference lithography
-
A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, and M. D. Perry, “Methods for fabricating array of holes using interference lithography, ” J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
-
(1997)
J. Vac. Sci. Technol.
, vol.B 15
, pp. 2439-2443
-
-
Fernandez, A.1
Decker, J.Y.2
Herman, S.M.3
Phillion, D.W.4
Sweeney, D.W.5
Perry, M.D.6
-
8
-
-
85010175524
-
Fabrication of high energy x-ray transmission gratings for AXAF
-
O. H. Siegmund and J. V. Vallerga, eds., Proc. SPIE
-
M. L. Schattenburg, R. J. Aucoin, R. C. Fleming, I. Plotnik, J. Porter, and H. I. Smith, “Fabrication of high energy x-ray transmission gratings for AXAF, ” in EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy V, O. H. Siegmund and J. V. Vallerga, eds., Proc. SPIE 2280, 181-190 (1994).
-
(1994)
EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy V
, vol.2280
, pp. 181-190
-
-
Schattenburg, M.L.1
Aucoin, R.J.2
Fleming, R.C.3
Plotnik, I.4
Porter, J.5
Smith, H.I.6
|