Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

IEEE Transactions on Nanotechnology

Volumn 5, Issue 1, 2006, Pages 3-6

  Capeluto, Maria G ^a,b   Vaschenko, Georgiy ^a,c,e   Grisham, Michael ^a,c   Marconi, Mario C ^{a,b,c,d,e,f,g}   Luduena S ^a,b   Pietrasanta, L ^a,b   Lu, Yunfeng ^a,e   Parkinson, Bruce ^a,e   Menoni, Carmen S ^a,c,e,f   Rocca, J J ^c  

^a IEEE   (Argentina)

^b UNIVERSIDAD DE BUENOS AIRES   (Argentina)

^c Department of Mechanical Engineering   (United States)

^d NATIONAL SCIENCE FOUNDATION   (United States)

^e Veterinary Dentistry and Oral Surgery   (United States)

^f OPTICAL SOCIETY OF AMERICA   (United States)

^g Argentinean Physical Society

Author keywords

Nanotechnology; Photolithography; X ray lasers; X ray lithography

Indexed keywords

EUV LASERS; X-RAY LASERS; X-RAY LITHOGRAPHY;

INTERFEROMETRY; LASERS; NANOTECHNOLOGY; PATTERN RECOGNITION; POLYMETHYL METHACRYLATES; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 31144454911     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2005.858599     Document Type: Article

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