Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

IEEE Transactions on Nanotechnology

Volumn 5, Issue 1, 2006, Pages 3-6

  Capeluto, Maria G ^a,b   Vaschenko, Georgiy ^a,c,e   Grisham, Michael ^a,c   Marconi, Mario C ^{a,b,c,d,e,f,g}   Luduena S ^a,b   Pietrasanta, L ^a,b   Lu, Yunfeng ^a,e   Parkinson, Bruce ^a,e   Menoni, Carmen S ^a,c,e,f   Rocca, J J ^c  

^a IEEE   (Argentina)

^b UNIVERSIDAD DE BUENOS AIRES   (Argentina)

^c Department of Chemical and Biological Engineering and School of Biomedical Engineering   (United States)

^d NATIONAL SCIENCE FOUNDATION   (United States)

^e Department of Ecosystem Science and Sustainability   (United States)

^f OPTICAL SOCIETY OF AMERICA   (United States)

^g Argentinean Physical Society

Author keywords

Nanotechnology; Photolithography; X ray lasers; X ray lithography

Indexed keywords

EUV LASERS; X-RAY LASERS; X-RAY LITHOGRAPHY;

INTERFEROMETRY; LASERS; NANOTECHNOLOGY; PATTERN RECOGNITION; POLYMETHYL METHACRYLATES; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 31144454911     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2005.858599     Document Type: Article

References (19)

1. V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, "Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 22, pp. 99-103, 2004.
2. H. H. Solak, D. He, W. Li, S. S. Gasson, S. S. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, "Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography," Appl. Phys. Lett., vol. 75, pp. 2328-2330, 1999.
3. H. H. Solak, D. He, W. Li, and F. Cerrina, "Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 17, pp. 3052-3057, 1999.
4. S. H. Zaidi and S. R. J. Brueck, "Multiple-exposure interferometric lithography," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 11, pp. 658-666, 1993.
5. Z. Yu, W. Wu, L. Chen, and S. Chou, "Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 19, pp. 2816-2819, 2001.
6. T. A. Savas, S. N. Shah, M. L. Schattenburg, J. M. Carter, and H. I. Smith, "Achromatic interferometric lithography for 100-nm-period gratings and grids," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 13, pp. 2732-2735, 1995.
7. M. Switkes, T. M. Bloomstein, and M. Rothschild, "Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography," Appl. Phys. Lett, vol. 77, pp. 3149-3151, 2000.
8. W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, "Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 16, pp. 3689-3694, 1998.
9. A. Yen, E. Anderson, R. A. Ghanbari, M. Schattenburg, and H. Smith, "Achromatic holographic configuration for 100-nm-period lithography," Appl. Opt., vol. 31, pp. 4540-4545, 1992.
10. B. Benware, C. Moreno, D. Burd, and J. J. Rocca, "Operation and output pulse characteristics of an extremely compact capillary-discharge tabletop soft-X-ray laser," Opt. Lett., vol. 22, pp. 796-798, 1997.
11. C. D. Macchietto, B. R. Benware, and J. J. Rocca, "Generation of millijoule-level soft-X-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier," Opt. Lett., vol. 24, pp. 1115-1117, 1999.
12. M. Born and E. Wolf, Principles of Optics, 7th ed. Cambridge, U.K.: Cambridge Univ. Press, 1999.
13. J. W. Goodman, Statistical Optics. New York: Wiley, 1985, pp. 171-187.
14. Y. Liu, M. Seminario, F. G. Tomasel, C. Chang, J. J. Rocca, and D. T. Attwood, "Achievement of essentially full spatial coherence in a high-average-power soft-X-ray laser," Phys. Rev A, Gen. Phys., vol. 63, 2001. Art. 033 802.
15. B. M. Luther, Y. Wang, M. A. Larotonda, D. Alessi, M. Berrill, M. C. Marconi, J. J. Rocca, and V. N. Shlyaptsev, "Saturated high-repetition-rate 18.9-nm tabletop laser in nickellike molybdenum," Opt. Lett., vol. 30, pp. 165-167, 2005.
16. Y. Wang, M. A. Larotonda, B. M. Luther, D. Alessi, M. Berril, V. N. Shlyaptsev, and J. J. Rocca, "Demonstration of high repetition rate tabletop soft X-ray lasers with saturated output at wavelengths down to 13.9 nm and gain down to 10.9 nm," Phys. Rev. Lett., submitted for publication.
17. R. Keenan, J. Dunn, P. K. Patel, D. F. Price, R. F. Smith, and V. N. Shlyaptsev, "High-repetition-rate grazing-incidence pumped X-ray laser operating at 18.9 nm," Phys. Rev. Lett., vol. 94, 2005, Art. 103 901.
18. C. Jacobsen and M. Howells, "A Technique For projection X-ray lithograpy using computer generated holograms," J. Appl. Phys., vol. 71, pp. 2993-3001, 1992.
19. A. Biswas and S. R. J. Brueck, "Simulation of the 45-nm half-pitch node with 193-nm immersion lithography - Imaging interferometric lithography and dipole illumination," J. Microlith., Microfab., Microsyst., vol. 3, pp. 35-43, 2004.