Optical and interferometric lithography -nanotechnology enablers

Proceedings of the IEEE

Volumn 93, Issue 10, 2005, Pages 1704-1721

  Brueck, S R J ^a,b,c  

^a IEEE   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

^c Department of Electrical and Computer Engineering ^*  (United States)

Author keywords

Epitaxy; Interference; Lithography; Metamaterials; Nanofluidics; Nanomagnetics; Nanophotonics; Nanoscience; Nanotechnology; Negative index materials

Indexed keywords

EPITAXIAL GROWTH; EXCIMER LASERS; HETEROJUNCTIONS; NANOTECHNOLOGY; PHOTONS; REFRACTIVE INDEX;

INTERFERENCE; METAMATERIALS; NANOFLUIDICS; NANOMAGNETICS; NANOPHOTONICS; NANOSCIENCE; NEGATIVE-INDEX MATERIALS;

LITHOGRAPHY;

EID: 26244443059     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2005.853538     Document Type: Conference Paper

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